Hard X-ray diffraction-limited nanofocusing with Kirkpatrick-Baez mirrors

被引：95
作者：
Mimura, H
Matsuyama, S
Yumoto, H
Hara, H
Yamamura, K
Sano, Y
Shibahara, M
End, K
Mori, Y
Nishino, Y
Tamasaku, K
Yabashi, M
Ishikawa, T
Yamauchi, K
机构：
[1] Osaka Univ, Grad Sch Engn, Dept Precis Sci & Technol, Suita, Osaka 5650871, Japan
[2] Osaka Univ, Grad Sch Engn, Res Ctr Ultra Precis Sci & Technol, Suita, Osaka 5650871, Japan
[3] Hyogo Prefectural Inst Technol, Suma Ku, Kobe, Hyogo 6540037, Japan
[4] RIKEN, SPring 8, Mikazuki, Hyogo 6795148, Japan
[5] JASRI, SPring 8, Mikazuki, Hyogo 6795148, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 2005年 / 44卷 / 16-19期
关键词：
X-ray; nanofocusing; focusing mirror; Kirkpatrick-Baez mirrors; diffraction limited focusing; plasma CVM; EEM; MSI; RADSI;
D O I：
10.1143/JJAP.44.L539
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Nanofocused X-ray beams are necessary for nanometer-scale spatial microscopy analysis. X-ray focusing using a Kirkpatrick-Baez setup with two total reflection mirrors is a promising method, allowing highly efficient and energy-tuneable focusing. In this paper, we report the development of ultraprecise mirror optics and the realization of a nanofocused hard-X-ray beam. Fabricated mirrors having a figure accuracy of 2 nm peak to valley height give ideal diffraction-limited focusing at the hard X-ray region. The focal size, defined as the full width at half maximum in the intensity profile, was 36 nm x 48 nm at an X-ray energy of 15 keV.
引用
收藏
页码：L539 / L542
页数：4
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