Controlled growth of GaN nanowires by pulsed metalorganic chemical vapor deposition

被引:59
|
作者
Kipshidze, G [1 ]
Yavich, B [1 ]
Chandolu, A [1 ]
Yun, J [1 ]
Kuryatkov, V [1 ]
Ahmad, I [1 ]
Aurongzeb, D [1 ]
Holtz, M [1 ]
Temkin, H [1 ]
机构
[1] Texas Tech Univ, Nano Tech Ctr, Lubbock, TX 79401 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.1850188
中图分类号
O59 [应用物理学];
学科分类号
摘要
Controlled and reproducible growth of GaN nanowires is demonstrated by pulsed low-pressure metalorganic chemical vapor deposition. Using self-assembled Ni nanodots as nucleation sites on (0001) sapphire substrates we obtain nanowires of wurtzite-phase GaN with hexagonal cross sections, diameters of about 100 nm, and well-controlled length. The nanowires are highly oriented and perpendicular to the growth surface. The wires have excellent structural and optical properties, as determined by x-ray diffraction, cathodoluminescence, and Raman scattering. The x-ray measurements show that the nanowires are under a complex strain state consistent with a superposition of hydrostatic and biaxial components. (C) 2005 American Institute of Physics.
引用
收藏
页码:1 / 3
页数:3
相关论文
共 50 条
  • [31] The growth of AlGaN/GaN heterojunction bipolar transistors by metalorganic chemical vapor deposition
    Lambert, DJH
    Huang, JJ
    Shelton, BS
    Wong, MM
    Chowdhury, U
    Zhu, TG
    Kwon, HK
    Liliental-Weber, Z
    Benarama, M
    Feng, M
    Dupuis, RD
    JOURNAL OF CRYSTAL GROWTH, 2000, 221 : 730 - 733
  • [32] GROWTH OF GAN METALORGANIC CHEMICAL-VAPOR-DEPOSITION LAYERS ON GAN SINGLE-CRYSTALS
    PAKULA, K
    BARANOWSKI, JM
    STEPNIEWSKI, R
    WYSMOLEK, A
    GRZEGORY, I
    JUN, J
    POROWSKI, S
    SAWICKI, M
    STAROWIEYSKI, K
    ACTA PHYSICA POLONICA A, 1995, 88 (05) : 861 - 864
  • [33] Optimization of GaN Nanowires Reformation Process by Metalorganic Chemical Vapor Deposition for Device-Quality GaN Templates
    Carrascon, Rosalia Delgado
    Dat Quoc Tran
    Sukkaew, Pitsiri
    Mock, Alyssa
    Ciechonski, Rafal
    Ohlsson, Jonas
    Zhu, Yadan
    Hultin, Olof
    Monemar, Bo
    Paskov, Plamen P.
    Samuelson, Lars
    Darakchieva, Vanya
    PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS, 2020, 257 (04):
  • [34] Dislocation confinement in the growth of Na flux GaN on metalorganic chemical vapor deposition-GaN
    20160301810750
    1600, American Institute of Physics Inc. (118):
  • [35] Growth of Rutile Titanium Dioxide Nanowires by Pulsed Chemical Vapor Deposition
    Shi, Jian
    Wang, Xudong
    CRYSTAL GROWTH & DESIGN, 2011, 11 (04) : 949 - 954
  • [36] Growth and UV detector of serrated GaN nanowires by chemical vapor deposition
    Ding, Wenhao
    Meng, Xianquan
    REVISTA MEXICANA DE FISICA, 2020, 66 (04) : 490 - 495
  • [37] Pulsed Metalorganic Chemical Vapor Deposition of High Quality AlN/GaN Superlattices for Intersubband Transitions
    Bayram, C.
    Fain, B.
    Pere-laperne, N.
    McClintock, R.
    Razeghi, M.
    QUANTUM SENSING AND NANOPHOTONIC DEVICES VI, 2009, 7222
  • [38] Growth of β-SiC nanowires and thin films by metalorganic chemical vapor deposition using dichloromethylvinylsilane
    Kang, BC
    Lee, SB
    Boo, JH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (04): : 1722 - 1725
  • [39] Growth and photoluminescence of zinc blende ZnS nanowires via metalorganic chemical vapor deposition
    Lei, M.
    Fu, X. L.
    Li, P. G.
    Tang, W. H.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2011, 509 (19) : 5769 - 5772
  • [40] Growth and characterization of thick GaN by sublimation method and homoepitaxial growth by metalorganic chemical vapor deposition
    Tokushima Univ, Tokushima, Japan
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, 3 (1637-1640):