Controlled growth of GaN nanowires by pulsed metalorganic chemical vapor deposition

被引:59
|
作者
Kipshidze, G [1 ]
Yavich, B [1 ]
Chandolu, A [1 ]
Yun, J [1 ]
Kuryatkov, V [1 ]
Ahmad, I [1 ]
Aurongzeb, D [1 ]
Holtz, M [1 ]
Temkin, H [1 ]
机构
[1] Texas Tech Univ, Nano Tech Ctr, Lubbock, TX 79401 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.1850188
中图分类号
O59 [应用物理学];
学科分类号
摘要
Controlled and reproducible growth of GaN nanowires is demonstrated by pulsed low-pressure metalorganic chemical vapor deposition. Using self-assembled Ni nanodots as nucleation sites on (0001) sapphire substrates we obtain nanowires of wurtzite-phase GaN with hexagonal cross sections, diameters of about 100 nm, and well-controlled length. The nanowires are highly oriented and perpendicular to the growth surface. The wires have excellent structural and optical properties, as determined by x-ray diffraction, cathodoluminescence, and Raman scattering. The x-ray measurements show that the nanowires are under a complex strain state consistent with a superposition of hydrostatic and biaxial components. (C) 2005 American Institute of Physics.
引用
收藏
页码:1 / 3
页数:3
相关论文
共 50 条
  • [1] Controlled growth of ternary alloy nanowires using metalorganic chemical vapor deposition
    Lim, Sung K.
    Tambe, Michael J.
    Brewster, Megan M.
    Gradecak, Silvija
    NANO LETTERS, 2008, 8 (05) : 1386 - 1392
  • [2] Growth of AlGaN nanowires by metalorganic chemical vapor deposition
    Su, J
    Gherasimova, M
    Cui, G
    Tsukamoto, H
    Han, J
    Onuma, T
    Kurimoto, M
    Chichibu, SF
    Broadbridge, C
    He, Y
    Nurmikko, AV
    APPLIED PHYSICS LETTERS, 2005, 87 (18) : 1 - 3
  • [3] Growth Model of a GaN Nanorod with the Pulsed-Growth Technique of Metalorganic Chemical Vapor Deposition
    Zhang, Xu
    Yang, Shaobo
    Tu, Charng-Gan
    Kiang, Yean-Woei
    Yang, C. C.
    CRYSTAL GROWTH & DESIGN, 2018, 18 (07) : 3767 - 3773
  • [4] Mechanism of selective area growth of GaN nanorods by pulsed mode metalorganic chemical vapor deposition
    Lin, Yen-Ting
    Yeh, Ting-Wei
    Dapkus, P. Daniel
    NANOTECHNOLOGY, 2012, 23 (46)
  • [5] Metalorganic chemical vapor deposition route to GaN nanowires with triangular cross sections
    Kuykendall, T
    Pauzauskie, P
    Lee, SK
    Zhang, YF
    Goldberger, J
    Yang, PD
    NANO LETTERS, 2003, 3 (08) : 1063 - 1066
  • [6] Growth and process modeling studies of nickel-catalyzed metalorganic chemical vapor deposition of GaN nanowires
    Burke, Robert A.
    Lamborn, Daniel R.
    Weng, Xiaojun
    Redwing, Joan M.
    JOURNAL OF CRYSTAL GROWTH, 2009, 311 (13) : 3409 - 3416
  • [7] Growth of InN and In-Rich InGaN Layers on GaN Templates by Pulsed Metalorganic Chemical Vapor Deposition
    Kadys, A.
    Malinauskas, T.
    Grinys, T.
    Dmukauskas, M.
    Mickevicius, J.
    Aleknavicius, J.
    Tomasiunas, R.
    Selskis, A.
    Kondrotas, R.
    Stanionyte, S.
    Lugauer, H.
    Strassburg, M.
    JOURNAL OF ELECTRONIC MATERIALS, 2015, 44 (01) : 188 - 193
  • [8] Growth of InN and In-Rich InGaN Layers on GaN Templates by Pulsed Metalorganic Chemical Vapor Deposition
    A. Kadys
    T. Malinauskas
    T. Grinys
    M. Dmukauskas
    J. Mickevičius
    J. Aleknavičius
    R. Tomašiūnas
    A. Selskis
    R. Kondrotas
    S. Stanionytė
    H. Lugauer
    M. Strassburg
    Journal of Electronic Materials, 2015, 44 : 188 - 193
  • [9] NOVEL METALORGANIC CHEMICAL VAPOR-DEPOSITION SYSTEM FOR GAN GROWTH
    NAKAMURA, S
    HARADA, Y
    SENO, M
    APPLIED PHYSICS LETTERS, 1991, 58 (18) : 2021 - 2023
  • [10] Growth of InGaN and GaN films by photoassisted metalorganic chemical vapor deposition
    Tomar, MS
    Rutherford, R
    New, C
    Kuenhold, KA
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2000, 63 (04) : 437 - 443