Chemical etching of thin SiOxCyHz films by post-deposition exposure to oxygen plasma

被引：20
|
作者：
Vallée, C
Granier, A
Aumaille, K
Cardinaud, C
Goullet, A
Coulon, N
Turban, G
机构：
[1] Univ Nantes, Lab Plasmas & Couches Minces, CNRS, IMN, F-44322 Nantes 3, France
[2] Univ Nantes, Ctr Microcaracterisat, CNRS, IMN, F-44322 Nantes 3, France
来源：
APPLIED SURFACE SCIENCE | 1999年 / 138卷
关键词：
SiO2; PECVD; ellipsometry; etching; TEM; AES;
D O I：
10.1016/S0169-4332(98)00387-0
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
SiOxCyHz films deposited in a O-2/TEOS plasma are post-exposed to an oxygen plasma. Real-time ellipsometric measurements combined with optical emission spectroscopy show a strong etching of the film in the first minutes. Spectroscopic ellipsometry, transmission electron microscopy (TEM) and Anger spectroscopy evidence structural modifications over several 10 nanometers. It is also shown that chemical reactions with O atoms are responsible for most of this effect and that during a deposition process there is really competition between deposition and etching by O atoms. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：57 / 61
页数：5
相关论文
共 50 条
  • [11] Effects of post-deposition heat treatment on the properties of low dielectric constant plasma polymerized decahydronaphthalene thin films deposited by plasma-enhanced chemical vapor deposition
    Yang, J
    Shim, C
    Jung, D
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2000, 39 (12B): : L1324 - L1326
  • [12] POST-DEPOSITION RESISTANCE CHANGES IN CERMET AND DISCONTINUOUS THIN-FILMS
    MORRIS, JE
    VACUUM, 1972, 22 (04) : 153 - &
  • [13] Characteristics of ZnO:Zn phosphor thin films by post-deposition annealing
    Li, W
    Mao, DS
    Zhang, F
    Wang, X
    Liu, XH
    Zou, SC
    Zhu, YK
    Li, Q
    Xu, JF
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2000, 169 : 59 - 63
  • [14] Post-Deposition Wetting and Instabilities in Organic Thin Films by Supersonic Molecular Beam Deposition
    Fabio Chiarella
    Carmine Antonio Perroni
    Federico Chianese
    Mario Barra
    Gabriella Maria De Luca
    Vittorio Cataudella
    Antonio Cassinese
    Scientific Reports, 8
  • [15] Plasma characterization of oxygen-tetramethylsilane mixtures for the plasma-enhanced CVD of SiOxCyHz thin films
    Yanguas-Gil, Angel
    Barranco, Angel
    Cotrino, Jose
    Groning, Pierangelo
    Gonzalez-Elipe, Agustin R.
    CHEMICAL VAPOR DEPOSITION, 2006, 12 (12) : 728 - 735
  • [16] Atomic layer deposition and post-deposition annealing of PbTiO3 thin films
    Harjuoja, J
    Kosola, A
    Putkonen, M
    Niinistö, L
    THIN SOLID FILMS, 2006, 496 (02) : 346 - 352
  • [17] Post-Deposition Wetting and Instabilities in Organic Thin Films by Supersonic Molecular Beam Deposition
    Chiarella, Fabio
    Perroni, Carmine Antonio
    Chianese, Federico
    Barra, Mario
    De Luca, Gabriella Maria
    Cataudella, Vittorio
    Cassinese, Antonio
    SCIENTIFIC REPORTS, 2018, 8
  • [18] Effects of post-deposition chemical treatment on the formation of mesoporous titania films
    Kitazawa, Nobuaki
    Sato, Hirokazu
    Watanabe, Yoshihisa
    JOURNAL OF MATERIALS SCIENCE, 2007, 42 (13) : 5074 - 5079
  • [19] Effects of post-deposition chemical treatment on the formation of mesoporous titania films
    Nobuaki Kitazawa
    Hirokazu Sato
    Yoshihisa Watanabe
    Journal of Materials Science, 2007, 42 : 5074 - 5079
  • [20] Effects of deposition time and post-deposition annealing on the physical and chemical properties of electrodeposited CdS thin films for solar cell application
    Echendu, O. K.
    Mbamara, U. S.
    Okeoma, K. B.
    Iroegbu, C.
    Madu, C. A.
    Ndukwe, I. C.
    Dharmadasa, I. M.
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2016, 27 (10) : 10180 - 10191
12345