Chemical etching of thin SiOxCyHz films by post-deposition exposure to oxygen plasma

被引：20
|
作者：
Vallée, C
Granier, A
Aumaille, K
Cardinaud, C
Goullet, A
Coulon, N
Turban, G
机构：
[1] Univ Nantes, Lab Plasmas & Couches Minces, CNRS, IMN, F-44322 Nantes 3, France
[2] Univ Nantes, Ctr Microcaracterisat, CNRS, IMN, F-44322 Nantes 3, France
来源：
APPLIED SURFACE SCIENCE | 1999年 / 138卷
关键词：
SiO2; PECVD; ellipsometry; etching; TEM; AES;
D O I：
10.1016/S0169-4332(98)00387-0
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
SiOxCyHz films deposited in a O-2/TEOS plasma are post-exposed to an oxygen plasma. Real-time ellipsometric measurements combined with optical emission spectroscopy show a strong etching of the film in the first minutes. Spectroscopic ellipsometry, transmission electron microscopy (TEM) and Anger spectroscopy evidence structural modifications over several 10 nanometers. It is also shown that chemical reactions with O atoms are responsible for most of this effect and that during a deposition process there is really competition between deposition and etching by O atoms. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：57 / 61
页数：5
相关论文
共 50 条
  • [1] Chemical etching of thin SiOxCyHz films by post-deposition exposure to oxygen plasma
    Vallee, C.
    Granier, A.
    Aumaille, K.
    Cardinaud, C.
    Goullet, A.
    Coulon, N.
    Turban, G.
    Applied Surface Science, 1999, 138 (1-4): : 57 - 61
  • [2] Post-deposition ageing reactions of plasma derived polyterpenol thin films
    Bazaka, Kateryna
    Jacob, Mohan V.
    POLYMER DEGRADATION AND STABILITY, 2010, 95 (06) : 1123 - 1128
  • [3] POST-DEPOSITION TREATMENTS OF CADMIUM SULFIDE THIN FILMS
    ESBITT, AS
    PHYSICA STATUS SOLIDI, 1965, 12 (01): : K35 - &
  • [4] High speed atmospheric plasma deposition of transparent ZnO thin films without post-deposition annealing
    Renaut, N.
    Jimenez, M.
    Dutroncy, J.
    Traisnel, M.
    THIN SOLID FILMS, 2015, 589 : 161 - 164
  • [5] Post-Deposition Annealing Effects on Ferromagnetic CoFeB Thin Films
    O'Dell, Ryan A.
    Phillips, Adam B.
    Geomiev, Daniel G.
    Jones, John G.
    Brown, Gail J.
    Heben, Michael J.
    IEEE TRANSACTIONS ON MAGNETICS, 2018, 54 (10)
  • [6] Effect of Post-Deposition Processing on ZnO Thin Films and Devices
    Yen, Tingfang
    Haungs, Alan
    Kim, Sung Jin
    Cartwright, Alexander
    Anderson, Wayne A.
    JOURNAL OF ELECTRONIC MATERIALS, 2010, 39 (05) : 568 - 572
  • [7] Post-deposition stress evolution in Cu and Ag thin films
    Chocyk, Dariusz
    Proszynski, Adam
    Gladyszewski, Grzegorz
    Pienkos, Tomasz
    Gladyszewski, Longin
    OPTICA APPLICATA, 2005, 35 (03) : 419 - 424
  • [8] Effect of Post-Deposition Processing on ZnO Thin Films and Devices
    Tingfang Yen
    Alan Haungs
    Sung Jin Kim
    Alexander Cartwright
    Wayne A. Anderson
    Journal of Electronic Materials, 2010, 39 : 568 - 572
  • [9] Enhanced oxygen sensing in ZrO2 thin films via atomic layer deposition by post-deposition annealing
    Martinez, Carolina Bohorquez
    Arce, Jorge Luis Vazquez
    Gallegos, Ana Karina Cuentas
    Tiznado, Hugo
    CERAMICS INTERNATIONAL, 2025, 51 (07) : 9464 - 9471
  • [10] Producing oxygen-rich WO3 thin films by post-deposition thermal annealing
    Nunes, S. E.
    Matte, L. C.
    da Cunha, C. R.
    MATERIALS RESEARCH EXPRESS, 2019, 6 (09)
12345