Effects of negative bias on the structural, topological and tribological properties of amorphous carbon films prepared by magnetron sputtering

被引:13
作者
Wang, Zhou [1 ]
Wang, Chengbing [2 ]
Zhang, Bin [1 ]
Wang, Qi [3 ]
Zhang, Junyan [1 ]
机构
[1] Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China
[2] Lanzhou Jiaotong Univ, Natl Engn Res Ctr Technol & Equipment Green Coati, Lanzhou 730070, Peoples R China
[3] Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China
基金
中国国家自然科学基金;
关键词
amorphous carbon films; magnetron sputtering; tribological; DIAMOND-LIKE-CARBON; MECHANICAL-PROPERTIES; BONDING STRUCTURE; RAMAN-SCATTERING; NITRIDE FILMS; PULSED-LASER; THIN-FILMS; MICROSTRUCTURE; GRAPHITE; COATINGS;
D O I
10.1002/sia.3702
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Amorphous carbon films were prepared in a magnetron sputtering system at different d.c. negative substrate biases(-50, -100, -150, -200 and -250 V). The surface roughness, hardness and tribological properties of as-deposited films were investigated based on the films' structural evolution. Compared with the films deposited at the negative bias of -50 and -250 V, the microstructure and bond configuration of the films deposited at negative bias of -150 V favored a more graphite-like structure, which had the maximum of graphiticclusters and ordering structures; meanwhile, the films deposited at bias of -150 V showed the minimum coefficient of friction (COF) in air, while the wear rate showed a decrease of two orders of magnitude. The tribotesting results were attributed to the increase of graphitic domains of amorphous carbon films which decreased the interfacial shear force and lowered the COF. The uniform and ordering structure induced steady and smooth friction curves. Copyright (C) 2010 John Wiley & Sons, Ltd.
引用
收藏
页码:1218 / 1223
页数:6
相关论文
共 50 条
  • [21] Effects of Annealing Temperature on the Properties of Copper Films Prepared by Magnetron Sputtering
    Liu Yiming
    Zhang Jianjun
    Zhang Wanggang
    Liang Wei
    Yu Bin
    Xue Jinbo
    JOURNAL OF WUHAN UNIVERSITY OF TECHNOLOGY-MATERIALS SCIENCE EDITION, 2015, 30 (01): : 92 - 96
  • [22] Structural, Mechanical and Tribological Properties of NbCN-Ag Nanocomposite Films Deposited by Reactive Magnetron Sputtering
    Wu, Fanjing
    Yu, Lihua
    Ju, Hongbo
    Asempah, Isaac
    Xu, Junhua
    COATINGS, 2018, 8 (02):
  • [23] Hydrogenated diamond-like carbon film prepared by RF bias assisting magnetron sputtering
    Ren, Xuelei
    Zhu, Hekang
    Liu, Na
    Wei, Qiuping
    Pu, Jiaxuan
    Ma, Li
    Wang, Yijia
    Xie, Youneng
    Wei, Bingqiang
    Yu, Zhiming
    Zhou, Kechao
    MATERIALS RESEARCH EXPRESS, 2019, 6 (07)
  • [24] STRUCTURAL-PROPERTIES OF AMORPHOUS-CARBON NITRIDE FILMS PREPARED BY REACTIVE RF-MAGNETRON SPUTTERING
    NAKAYAMA, N
    TSUCHIYA, Y
    TAMADA, S
    KOSUGE, K
    NAGATA, S
    TAKAHIRO, K
    YAMAGUCHI, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (10A): : L1465 - L1468
  • [25] Effects of nitrogen flow rate on the microstructure and mechanical and tribological properties of TiAlN films prepared via reactive magnetron sputtering
    Niu, Xiaoyan
    Dong, Guoqiang
    Wei, Shaoteng
    Wang, Yujiang
    Wang, Bo
    Tian, Haoliang
    CERAMICS INTERNATIONAL, 2023, 49 (12) : 19885 - 19894
  • [26] Microstructural, Nanomechanical and Tribological Properties of ZrAlN Thin Films Prepared by Pulsed DC Magnetron Sputtering
    Kuppusami, P.
    Singh, Akash
    Mohandas, E.
    2013 INTERNATIONAL CONFERENCE ON ADVANCED NANOMATERIALS AND EMERGING ENGINEERING TECHNOLOGIES (ICANMEET), 2013, : 55 - 57
  • [27] Effects of deposition temperature on the mechanical and structural properties of amorphous Al-Si-O thin films prepared by radio frequency magnetron sputtering
    Karlsson, Stefan
    Eklund, Per
    Osterlund, Lars
    Birch, Jens
    Ali, Sharafat
    THIN SOLID FILMS, 2023, 787
  • [28] Effects of working pressure on structure and properties of Al-containing amorphous carbon films prepared by high-power impulse magnetron sputtering
    Peng, Ya-Li
    Guo, Chao-Qian
    Lin, Song-Sheng
    Shi, Qian
    Wei, Chun-Bei
    Su, Yi-Fan
    Wu, Yi-Qian
    Tang, Peng
    Zhu, Xia-Gao
    Dai, Ming-Jiang
    JOURNAL OF ALLOYS AND COMPOUNDS, 2020, 816 (816)
  • [29] Microstructure and Tribological Properties of CrN Films Deposited by Direct Current Magnetron Sputtering
    Ren Xingrun
    Zhang Qinying
    Huang Zhu
    Su Wei
    Yang Jiangao
    Chen Hao
    RARE METAL MATERIALS AND ENGINEERING, 2018, 47 (08) : 2283 - 2289
  • [30] Structural, nanomechanical and electrochemical properties of TiC and TiN films prepared by pulsed DC magnetron sputtering technique
    Suresh, Udaiyappan
    Kuppusami, P.
    Ramaseshan, R.
    Dhanalakshmi, S.
    MATERIALS TODAY-PROCEEDINGS, 2021, 47 : 1091 - 1098