Radiation-induced defects in MOS structures after irradiation with high-energy Ar, Kr, Bi heavy ions

被引:6
|
作者
Stano, J [1 ]
Skuratov, VA
Ziska, M
Kovác, P
机构
[1] Cyclotron Ctr Slovak Republ, Slovak Off Standards Metrol & Testing, Bratislava 81005, Slovakia
[2] Joint Inst Nucl Res, Flerov Lab Nucl React, Dubna 141980, Russia
[3] Slovak Univ Technol Bratislava, Fac Elect Engn & Informat, Dept Microelect, Bratislava 81219, Slovakia
关键词
MOS structure; Q-DLTS; radiation damage; high-energy heavy ions; thermal-spike model;
D O I
10.1016/j.vacuum.2005.01.098
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Radiation damage in the MOS (metal-oxide-semiconductor) structures irradiated with At, Kr and Bi heavy ions with energies from 1 to 7.5MeV/nucl. has been studied using charge deep level transient spectroscopy (Q-DLTS) and feedback charge capacitance voltage (C-V) techniques. Four dominant well-known deep levels such as vacancy-oxygen (VO) complex, divacancy (VV2-) in the double negative charge state and composite VV-+VSb complex were registered versus ion fluence and annealing temperature. It was shown that VO center concentration at the near-surface silicon substrate layer is determined by ion energy loss in elastic collisions and no effect of high-level electronic stopping power was detected. At the same time, the value of the positive radiation-induced defect charge in the oxide layer was decreased under Bi ions irradiation. Thermal treatment in air ambient at 250 degrees C restores CV characteristics of the MOS samples to that of un-irradiated state. (c) 2005 Elsevier Ltd. All rights reserved.
引用
收藏
页码:627 / 630
页数:4
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