Impact of substrate pits on laser-induced damage performance of 1064-nm high-reflective coatings

被引:28
作者
Chai, Yingjie [1 ,2 ]
Zhu, Meiping [1 ]
Bai, Zhengyuan [1 ,2 ]
Yi, Kui [1 ]
Wang, Hu [1 ,2 ]
Cui, Yun [1 ]
Shao, Jianda [1 ]
机构
[1] Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
[2] Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R China
基金
中国国家自然科学基金;
关键词
MULTILAYER MIRRORS; NODULAR DEFECTS; ABSORPTION; INTERFACE; THRESHOLD; SILICA;
D O I
10.1364/OL.40.001330
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The laser damage resistance of coatings in high-power laser systems depends significantly on the surface quality of the substrate. In our experiment, pits were precisely fabricated on the surface of fused silica substrate using a femtosecond laser processing bench. The HfO2/SiO2 high-reflective coatings at 1064 nm were deposited by conventional e-beam evaporation onto fused silica substrates with and without pits, respectively. The internal crack that was induced by the substrate geometrical structure was first observed in our experiment. The laser-induced damage threshold test showed negative effects of the substrate pits on the laser resistance of high-reflective coatings. Simulations by the finite element method were carried out, and results demonstrated that the modulation of a high reflector multilayer geometry could lead to electrical-field amplification and reduce laser damage resistance. Combined with its poor mechanical properties, the pits on substrate could contribute to the occurrence of damages. (C) 2015 Optical Society of America
引用
收藏
页码:1330 / 1333
页数:4
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