Deposition of Y2O3 stabilized ZrO2 thin films from Zr(DPM)4 and Y(DPM)3 by aerosol-assisted MOCVD

被引：14
|
作者：
Song, HZ [1 ]
Xia, CR [1 ]
Jiang, YZ [1 ]
Meng, GY [1 ]
Peng, DK [1 ]
机构：
[1] Univ Sci & Technol China, Dept Mat Sci & Engn, Lab Solid State Chem & Inorgan Membranes, Hefei 230026, Peoples R China
来源：
MATERIALS LETTERS | 2003年 / 57卷 / 24-25期
关键词：
aerosol; MOCVD; thin films; Y2O3 stabilized ZrO2;
D O I：
10.1016/S0167-577X(03)00187-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A novel aerosol-assisted metalorganic chemical vapor deposition (AA-MOCVD) technology was developed to prepare of Y2O3-stabilized ZrO2 (YSZ) thin films on polycrystalline substrates at the temperatures of 350-700degreesC from metal beta-diketonate chelates precursors. Thin films with rather uniform and amorphous microstructure were obtained at the substrate temperatures below 600degreesC and changed into full cubic microstructure after annealing treatment at 1100degreesC for 3 h. A detailed deposition mechanism has described the AA-MOCVD process. The resistance measurement of electrochemical cell Pt/Ni-YDC/YSZ film/Pt showed that conductivity activation energy (E-a) changed at 610degreesC with 85.8 kJ/mol at 610-850degreesC and 136 kJ/mol at 350-610degreesC. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：3833 / 3838
页数：6
相关论文
共 50 条
  • [1] Formation and rate processes of Y2O3 stabilized ZrO2 thin films from Zr(DPM)4 and Y(DPM)3 by cold-wall aerosol-assisted MOCVD
    Jiang, YZ
    Song, HZ
    Gao, JF
    Meng, GY
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2005, 152 (07) : C498 - C503
  • [2] Fabrication and characterization of Y2O3 stabilized ZrO2 films deposited with aerosol-assisted MOCVD
    Jiang, Yinzhu
    Gao, Hanfeng
    Liu, Mingfei
    Wang, Yanyan
    Meng, Guangyao
    SOLID STATE IONICS, 2007, 177 (39-40) : 3405 - 3410
  • [3] Chemical vapor deposition of Y2O3 films using Y(dpm)3
    Bakovets, VV
    Levashova, TM
    Ratushnyak, VT
    Bakhturova, LF
    INORGANIC MATERIALS, 2002, 38 (04) : 371 - 373
  • [4] Chemical Vapor Deposition of Y2O3 Films Using Y(dpm)3
    V. V. Bakovets
    T. M. Levashova
    V. T. Ratushnyak
    L. F. Bakhturova
    Inorganic Materials, 2002, 38 : 371 - 373
  • [5] Structural and optical properties of Y2O3 stabilized ZrO2 thin films
    Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
    不详
    不详
    Guangzi Xuebao, 2007, 6 (1092-1096): : 1092 - 1096
  • [6] Yttria stabilized zirconia solid electrolyte surface modification with ZrO2, Y2O3, and ZrO2 + 9 mol % Y2O3 films
    L. A. Dunyushkina
    A. I. Vshivkova
    A. A. Pankratov
    B. D. Antonov
    V. P. Gorelov
    Russian Journal of Electrochemistry, 2010, 46 : 767 - 773
  • [7] GROWTH OF Y2O3, YB2O3, ZRO2, AND Y2O3 STABILIZED ZRO2 FILM BY CVD PROCESSES
    PENG, D
    MENG, G
    YU, H
    FAN, Q
    SHEN, Y
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C483 - C483
  • [8] TWEED MICROSTRUCTURE IN Y2O3 STABILIZED ZRO2
    HEUER, AH
    LANTERI, V
    CHAIM, R
    JOURNAL OF METALS, 1985, 37 (11): : A58 - A58
  • [9] Deposition of Sm2O3 doped CeO2 thin films from Ce(DPM)4 and Sm(DPM)3 (DPM=2,2,6,6-tetramethyl-3,5-heptanedionato) by aerosol-assisted metal-organic chemical vapor deposition
    Jiang, Yinzhu
    Song, Haizheng
    Ma, Qianli
    Meng, Guangyao
    THIN SOLID FILMS, 2006, 510 (1-2) : 88 - 94
  • [10] Analysis of tensile strength of Y2O3 stabilized ZrO2
    Nakayama, Y
    Kakita, S
    ADVANCES IN ENGINEERING PLASTICITY, PTS 1-2, 2000, 177-1 : 467 - 472
12345