Surface reactions in the chemical vapor deposition of highly transparent and conductive fluorine-doped zinc oxide

被引：0
|
作者：
Gordon, RG [1 ]
Liang, HF [1 ]
机构：
[1] Harvard Univ, Chem Labs, Cambridge, MA 02138 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1998年 / 216卷
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
201-PHYS
引用
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页码：U718 / U718
页数：1
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