Chemical vapour deposition and atomic layer deposition of amorphous and nanocrystalline metallic coatings: Towards deposition of multimetallic films

被引：8

作者：

Blanquet, Elisabeth ^{[1
]}

Mantoux, Arnaud ^{[1
]}

Pons, Michel ^{[1
]}

Vahlas, Constantin ^{[2
]}

机构：

[1] UJF, CNRS, Grenoble INP, SIMaP, F-38402 St Martin Dheres, France

[2] ENSIACET, CIRIMAT, F-31432 Toulouse 4, France

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2010年 / 504卷

关键词：

CVD; ALD; Thin films; Thermodynamics; GLASSES; ALD;

D O I：

10.1016/j.jallcom.2010.03.205

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

This paper provides a prospective insight on chemical vapour deposition (CVD) and atomic layer deposition (ALD) as dry techniques for the processing of amorphous and nanocrystalline metallic thin films. These techniques are part of major technologies in application fields such as microelectronics, energy, or protective coatings. From thermodynamic analysis, areas of investigation to generate a set of materials with the strongest propensity for amorphization as well as useful guidelines for the target phase material deposition are provided. Prospective to develop MOCVD (metalorganic chemical vapour deposition) and ALD of intermetallic films, in view of fabrication of metallic glass thin films is proposed. Examples from selected ALD and MOCVD single element metallic deposition processes will be described to illustrate the effect of deposition parameters on the physico-chemical properties of the films. This processing approach is particularly promising for metallic glass thin films. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：S422 / S424

页数：3

共 22 条

[1]

Bradly A.Z., 2005, US Patent, Patent No. [0227007 A1, 0227007]

[2] ELECTRODEPOSITION OF ALLOYS OF PHOSPHORUS WITH NICKEL OR COBALT [J].

BRENNER, A ;

COUCH, DE ;

WILLIAMS, EK .

JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1950, 44 (01) :109-122

[3] Why is coordination chemistry stretching the limits of micro-electronics technology? [J].

Doppelt, P .

COORDINATION CHEMISTRY REVIEWS, 1998, 178 :1785-1809

[4] Micropillar compression studies on a bulk metallic glass in different structural states [J].

Dubach, A. ;

Raghavan, R. ;

Loeffler, J. F. ;

Michler, J. ;

Ramamurty, U. .

SCRIPTA MATERIALIA, 2009, 60 (07) :567-570

[5] METALLIC GLASSES [J].

GREER, AL .

SCIENCE, 1995, 267 (5206) :1947-1953

[6] Stabilization of metallic supercooled liquid and bulk amorphous alloys [J].

Inoue, A .

ACTA MATERIALIA, 2000, 48 (01) :279-306

[7] Deposition of copper films by an alternate supply of CuCl and Zn [J].

Juppo, M ;

Ritala, M ;

Leskela, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (04) :2330-2333

[8] Influence of deposition conditions and ion irradiation on thin films of amorphous Cu-Zr superconductors [J].

Karpe, N ;

Bottiger, J ;

Krog, JP ;

Nordstrom, A ;

Rapp, O .

THIN SOLID FILMS, 1996, 275 (1-2) :82-86

[9]

Kim JG, 2009, J CERAM PROCESS RES, V10, P21

[10] Ni-Ti-Zr-Si-Sn bulk metallic glass particle deposition and coating formation in vacuum plasma spraying [J].

Kim, Juneseob ;

Lee, Changhee ;

Choi, Hanshin ;

Jo, Hyungho ;

Kim, Hwijun .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2007, 449 :858-862

← 1 2 3 →