Structural and optical properties of very high quality GaAs/AlGaAs multiple quantum well structures grown on (111)A substrates by MOVPE

被引:1
作者
Sanz-Hervas, A
Cho, SH
Kovalenkov, OV
Dickey, SA
Majerfeld, A
Villar, C
Lopez, M
Melliti, R
Wang, G
Tronc, P
Kim, BW
机构
[1] Univ Colorado, Dept Elect & Comp Engn, Boulder, CO 80309 USA
[2] Univ Valladolid, Dpto Teoria Senal & Comunicac & Ingn Telemat, ETSIT, E-47011 Valladolid, Spain
[3] Ecole Super Phys & Chim Ind, Lab Opt Phys, F-75231 Paris, France
[4] Elect & Telecommun Res Inst, Taejon 305600, South Korea
来源
COMPOUND SEMICONDUCTORS 1997 | 1998年 / 156卷
关键词
D O I
10.1109/ISCS.1998.711638
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report an investigation of the structural and optical properties of the first high quality GaAs/AlGaAs multi-quantum-well structures grown on (111)A substrates by the metallorganic vapor phase epitaxial process at the relatively low temperature of 600 degrees C. By high-resolution x-ray diffractometry it is shown that the structure analyzed has a good crystal quality and period reproducibility. The structural and optical properties were also investigated by photoluminescence and photoreflectance spectroscopies. A photoluminescence linewidth of 12.3 meV at 11 K indicates that the well length (105 Angstrom) fluctuation over 10 periods is at most +/-3 monolayers. A detailed analysis of the photoreflectance spectrum at 11 K permits an excellent identification of all the allowed and also weakly allowed optical transitions expected for this structure, further demonstrating that the heterointerfaces are abrupt and smooth.
引用
收藏
页码:291 / 294
页数:4
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