Space charge behaviors in cable insulation under a direct current-superimposed pulsed electric field

被引:20
作者
He, Dongxin [1 ]
Zhang, Tao [1 ]
Meng, Fansong [1 ]
Li, Qingquan [1 ]
Wang, Wei [2 ]
Liu, Hongshun [1 ]
Teyssedre, Gilbert [3 ]
机构
[1] Shandong Univ, Sch Elect Engn, Shandong Prov Key Lab UHV Transmiss Technol & Equ, Jinan 250061, Shandong, Peoples R China
[2] North China Elect Power Univ, Beijing Key Lab High Voltage & Electromagnet Comp, Beijing, Peoples R China
[3] Univ Toulouse, CNRS, UPS, LAPLACE Lab Plasma & Convers Energie,INPT, Toulouse, France
基金
中国国家自然科学基金;
关键词
TREE INITIATION; SILICONE-RUBBER; SURFACE-CHARGE; DC;
D O I
10.1049/hve2.12032
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
When high-voltage direct current (HVDC) cables are subjected to a direct current(DC)-superimposed pulsed electric stress, the pulsed voltage applied facilitates electrical tree generation and breakdown; however, the mechanism involved remains unclear. To study the deterioration mechanism of cable insulation under a pulsed electric field, an experiment on the dynamic characteristics of space charge under a DC-superimposed pulsed electric field was conducted. For this experiment, a pulsed time trigger control circuit was developed to accurately measure the change law of the space charge in cross-linked polyethylene samples at the rising and falling edges of the pulsed electric field. The experimental results showed an unusual change law: the space charge density increases with falling voltage amplitude and decreases with rising voltage amplitude. The sudden change in the electric field breaks the balance of the forces acting on the space charge, leading to injection, extraction and migration. The energy released during these dynamic processes may destroy the microstructure of the insulation material and contributes to the growth of the electrical tree. This study provides an insight on the initiation mechanism of electrical tree in HVDC cables and proposes a strategy to suppress electrical tree initiation.
引用
收藏
页码:426 / 434
页数:9
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