Formation Mechanisms of GaN Nanowires Grown by Selective Area Growth Homoepitaxy

被引:98
作者
Gacevic, Zarko [1 ]
Gomez Sanchez, Daniel [1 ]
Calleja, Enrique [1 ]
机构
[1] Univ Politecn Madrid, ISOM ETSIT, E-28040 Madrid, Spain
关键词
GaN nanowires; molecular beam epitaxy; selective area growth; formation mechanism; morphological evolution; MOLECULAR-BEAM EPITAXY; NANOSTRUCTURES; TEMPERATURE; NANOCOLUMNS; SUBSTRATE; WIRES;
D O I
10.1021/nl504099s
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
This work provides experimental evidence and theoretical explanations regarding the formation mechanisms of GaN nanowires grown by selective area growth on GaN-on-sapphire templates. The first growth stage, driven by selective area growth kinetics, consists of initial nucleation (along the nanohole inner periphery), coalescence onset and full coalescence, producing a single nanocrystal within each nanohole. In the second growth stage, driven by free-surface-energy minimization, the formed nanocrystal undergoes morphological evolution, exhibiting initial cylindrical-like shape, intermediate dodecagonal shape and a final, thermodynamically stable hexagonal shape. From this point on, the nanowire vertical growth proceeds while keeping the stable hexagonal form.
引用
收藏
页码:1117 / 1121
页数:5
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