HREM study of 3C-SiC nanoparticles: influence of growth conditions on crystalline quality

被引:13
作者
Buschmann, V
Klein, S
Fuess, H
Hahn, H
机构
[1] Tech Univ Darmstadt, Dept Mat Sci, Struct Res Div, D-64287 Darmstadt, Germany
[2] Tech Univ Darmstadt, Dept Mat Sci, Thin Films Div, D-64287 Darmstadt, Germany
关键词
high resolution electron microscopy (HREM); 3C-SiC nanoparticles; growth conditions; slip planes; stacking effects;
D O I
10.1016/S0022-0248(98)00537-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
In this contribution, we report on the influence of the growth conditions on the final crystalline quality of 3C-SiC nanoparticles with dimensions around 3-10 nm. The nanoparticles are grown by chemical vapour synthesis in a hot wall reactor using tetramethylsilane [(CH3)(4)Si] as precursor. By altering the decomposition temperature and reactor pressure, the clusters may be amorphous at low temperatures or crystalline at elevated temperatures. Crystalline nanoparticles show a one-dimensional stacking disorder with slip planes lying on different families of {1 1 1} planes when prepared at high reactor pressure. By lowering the pressure, only one-dimensional disordered particles along single (1 1 1) planes are observed. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:335 / 341
页数:7
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