Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

被引:26
作者
Lewis, Brett B. [1 ]
Stanford, Michael G. [1 ]
Fowlkes, Jason D. [1 ,2 ]
Lester, Kevin [2 ]
Plank, Harald [3 ]
Rack, Philip D. [1 ,2 ]
机构
[1] Univ Tennessee, Dept Mat Sci & Engn, Knoxville, TN 37996 USA
[2] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Nanofabricat Res Lab, Oak Ridge, TN 37381 USA
[3] Graz Univ Technol, Inst Electron Microscopy & Nanoanal, A-8010 Graz, Austria
关键词
beam induced processing; direct-write; electron beam induced deposition; nano; ATOMIC LAYER DEPOSITION; RESOLUTION;
D O I
10.3762/bjnano.6.94
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Platinum-carbon nanostructures deposited via electron beam induced deposition from MeCpPt(IV)Me-3 are purified during a post-deposition electron exposure treatment in a localized oxygen ambient at room temperature. Time-dependent studies demonstrate that the process occurs from the top-down. Electron beam energy and current studies demonstrate that the process is controlled by a confluence of the electron energy loss and oxygen concentration. Furthermore, the experimental results are modeled as a 2nd order reaction which is dependent on both the electron energy loss density and the oxygen concentration. In addition to purification, the post-deposition electron stimulated oxygen purification process enhances the resolution of the EBID process due to the isotropic carbon removal from the as-deposited materials which produces high-fidelity shape retention.
引用
收藏
页码:907 / 918
页数:12
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