Diffraction anomalous fine-structure study of strained Ga1-xInxAs on GaAs(001)

被引:21
作者
Woicik, JC [1 ]
Cross, JO
Bouldin, CE
Ravel, B
Pellegrino, JG
Steiner, B
Bompadre, SG
Sorensen, LB
Miyano, KE
Kirkland, JP
机构
[1] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA
[2] USN, Res Lab, Washington, DC 20375 USA
[3] Univ Washington, Dept Phys, Seattle, WA 98195 USA
[4] CUNY Brooklyn Coll, Dept Phys, Brooklyn, NY 11210 USA
[5] SFA Inc, Largo, MD 20774 USA
来源
PHYSICAL REVIEW B | 1998年 / 58卷 / 08期
关键词
D O I
10.1103/PhysRevB.58.R4215
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Diffraction anomalous fine-structure measurements performed at both the Ga and As K edges have determined the Ga-As bond length to be 2.442+/-0.005 Angstrom in a buried, 213-Angstrom-thick Ga0.785In0.215As layer grown coherently on GaAs(001). This bond length corresponds to a strain-induced contraction of 0.013+/-0.005 Angstrom relative to the Ga-As bond length in bulk Ga1-xInxAs of the same composition. Together with recent extended x-ray-absorption fine-structure measurements performed at the In K edge [Woicik et al., Phys. Rev. Lett. 79, 5026 (1997)], excellent agreement is found with the uniform bond-length distortion model for strained-layer semiconductors on (001) substrates.
引用
收藏
页码:R4215 / R4218
页数:4
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