Near-infrared carbon-implanted waveguides in Tb3+-doped aluminum borosilicate glasses

Ion implantation has played a unique role in the fabrication of optical waveguide devices. Tb3+-doped aluminum borosilicate (TDAB) glass has been considered as an important magneto-optical material. In this work, near-infrared waveguides have been manufactured by the (5.5 + 6.0) MeV C3+ ion implantation with doses of (4.0 (+) 8.0) x 10(13) ions center dot cm(-2) in the TDAB glass. The modes propagated in the TDAB glass waveguide were recorded by a prism-coupling system. The finite-difference beam propagation method (FD-BPM) was carried out to simulate the guiding characteristics of the TDAB glass waveguide. The TDAB glass waveguide allows the light propagation with a single-mode at 1.539 mu m and can serve as a potential candidate for future waveguide isolators.