Perovskite Nanoparticle Composite Films by Size Exclusion Lithography

被引:32
作者
Duong Nguyen Minh [1 ]
Eom, Sangwon [1 ]
Lan Anh Thi Nguyen [2 ]
Kim, Juwon [1 ]
Sim, Jae Hyun [1 ]
Seo, Chunhee [1 ]
Nam, Jihye [1 ]
Lee, Sangheon [1 ]
Suk, Soyeon [1 ]
Kim, Jaeyong [2 ]
Kang, Youngjong [3 ]
机构
[1] Hanyang Univ, Dept Chem, 222 Wangsimni Ro, Seoul 04763, South Korea
[2] Hanyang Univ, Dept Phys, HYU HPSTAR CIS High Pressure Res Ctr, Seoul 04763, South Korea
[3] Hanyang Univ, Dept Chem, Res Inst Nat Sci, Inst Nano Sci & Technol, 222 Wangsimni Ro, Seoul 04763, South Korea
基金
新加坡国家研究基金会;
关键词
composite; lithography; mass-transfer; perovskite; size exclusion; SOLAR-CELLS; HALIDE PEROVSKITES; NANOCRYSTALS; PHOTOLUMINESCENCE; LUMINESCENT; EFFICIENCY; STABILITY; BR; CL;
D O I
10.1002/adma.201802555
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Perovskite nanoparticle composite films with capability of high-resolution patterning (>= 2 mu m) and excellent resistance to various aqueous and organic solvents are prepared by in situ photosynthesis of acrylate polymers and formamidinium lead halide (FAPbX(3)) nanoparticles. Both positive- and negative-tone patterns of FAPbX(3) nanoparticles are created by controlling the size exclusive flow of nanoparticles in polymer networks. The position of nanoparticles is spatially controlled in both lateral and vertical directions. The composite films show high photoluminescence quantum yield (up to 44%) and broad color tunability in visible region (lambda(peak) = 465-630 nm).
引用
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页数:7
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