A catalytic, catalyst-free, and roll-to-roll production of graphene via chemical vapor deposition: Low temperature growth

被引:54
作者
Naghdi, Samira [1 ]
Rhee, Kyong Yop [1 ]
Park, Soo Jin [2 ]
机构
[1] Kyung Hee Univ, Coll Engn, Dept Mech Engn, Yongin 446701, South Korea
[2] Inha Univ, Coll Nat Sci, Chem, Incheon 402751, South Korea
基金
新加坡国家研究基金会;
关键词
HIGH-QUALITY GRAPHENE; LARGE-AREA SYNTHESIS; FEW-LAYER GRAPHENE; ATMOSPHERIC-PRESSURE; CVD GROWTH; CARBON; COPPER; OXIDATION; NICKEL; FILMS;
D O I
10.1016/j.carbon.2017.10.065
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The application of graphene as a two-dimensional nano-material has gained wide interest in different research areas, but its use is still novel for scientists. There has been continuous progress in the development of different synthesis methods to readily produce graphene at a lower cost. Chemical vapor deposition (CVD) is a powerful process to produce graphene, and it is accompanied by other methods. The present article provides a detailed review of the synthesis of graphene by a CVD process at temperatures below 1000 degrees C (LTCVD). In this work, challenges related to the use of plasma-assisted CVD, different carbon precursors, and catalysts are discussed. (C) 2017 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1 / 12
页数:12
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