Uniformity study of GaAs-based vertical-cavity surface-emitting laser epiwafer grown by MOCVD technique
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作者:
Alias, Mohd Sharizal
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Univ Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, MalaysiaUniv Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, Malaysia
Alias, Mohd Sharizal
[1
]
Leisher, Paul O.
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Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USAUniv Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, Malaysia
Leisher, Paul O.
[2
]
Choquette, Kent D.
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Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USAUniv Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, Malaysia
Choquette, Kent D.
[2
]
Anuar, Khairul
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Univ Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, MalaysiaUniv Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, Malaysia
Anuar, Khairul
[1
]
Siriani, Dominic
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Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USAUniv Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, Malaysia
Siriani, Dominic
[2
]
Mitani, Sufian
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Univ Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, MalaysiaUniv Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, Malaysia
Mitani, Sufian
[1
]
Razman Y., Mohd
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Univ Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, MalaysiaUniv Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, Malaysia
Razman Y., Mohd
[1
]
Fatah A. M., Abdul
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Univ Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, MalaysiaUniv Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, Malaysia
Fatah A. M., Abdul
[1
]
机构:
[1] Univ Putra Malaysia, MTDC, Idea Tower, TMR&D, Serdang 43400, Selangor, Malaysia
[2] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
来源:
2006 IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS, PROCEEDINGS
|
2006年
关键词:
D O I:
10.1109/SMELEC.2006.381052
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
In this paper, a highly uniform 850 urn VCSEL epiwafer was grown by using MOCVD technique. The VCSEL quantum wells exhibit a peak emission wavelength of 839.5 nm. The grown epiwafer exhibits a Fabry-Perot cavity resonance at 846.5 nm. Various VCSEL devices fabricated from the center to the edge of the VCSEL epiwafer show similar trend for the L-I and output spectral characterizations. Devices fabricated at the edge of the epiwafer exhibits different characterization trends due to the growth limitations.