Effect of High-Energy Electron Beam Irradiation on the Surface Morphology of CaF2/Si(100) Heterostructures

被引：6
作者：
Velichko, A. A. [1 ]
Ilyushin, V. A. [1 ]
Ostertak, D. I. [1 ]
Peisakhovich, Yu. G. [1 ]
Filimonova, N. I. [1 ]
机构：
[1] Novosibirsk State Tech Univ, Novosibirsk 630092, Russia
来源：
JOURNAL OF SURFACE INVESTIGATION-X-RAY SYNCHROTRON AND NEUTRON TECHNIQUES | 2007年 / 1卷 / 04期
关键词：
Electron Beam; Surface Investigation; Neutron Technique; Very Large Scale Integrate; Electron Beam Exposure;
D O I：
10.1134/S1027451007040209
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
The effect of high-energy electron beam irradiation on the surface morphology of CaF(2) films in the course of molecular-beam epitaxy on Si(100) substrates is studied by atomic-force microscopy. It is shown that not only do morphological defects significantly change their shape in the electron beam spot, but also their average height more than doubles.
引用
收藏
页码：479 / 486
页数：8
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