Second-order optical nonlinearity in thermally poled multilayer germanosilicate thin films

被引：3

作者：

Li, W. T. ^{[2
]}

An, H. ^{[1
]}

Fleming, S. ^{[1
]}

机构：

[1] Univ Sydney, Opt Fibre Technol Ctr, Natl Innovat Ctr 206, Eveleigh, NSW 1430, Australia

[2] Australian Natl Univ, Res Sch Phys Sci & Engn, Canberra, ACT 0200, Australia

来源：

ELECTRONICS LETTERS | 2008年 / 44卷 / 10期

关键词：

Doping (additives) - Harmonic generation - Nonlinear optics - Optical microscopy - Optical multilayers;

D O I：

10.1049/el:20080618

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The Maker fringe method and second-harmonic light microscopy were applied to investigate the second-order optical nonlinearity induced in thermally poled silica thin films. It was found that the nonlinearity in Ge-doped film was more than three times that in pure silica film. Results from the second-harmonic microscopy revealed that, in the Ge-doped silica thin films with varying Ge-doping concentration along the thin film depth, the nonlinearity exhibited a multilayer distribution with peaks located at positions with highest contrast in Ge-doping profile.

引用

页码：639 / 640

页数：2

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