The influence of lattice parameter variation on microstructure of GaN single crystals

被引:33
作者
Krysko, A
Sarzynski, M
Domagala, J
Grzegory, I
Lucznik, B
Kamler, G
Porowski, S
Leszczynski, M
机构
[1] UNIPRESS, High Pressure Res Ctr, Warsaw, Poland
[2] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
关键词
GaN; HVPE; XRD;
D O I
10.1016/j.jallcom.2004.10.077
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Free-electrons expand the lattice of GaN [M. Leszczynski, I. Grzegory, M. Bockowski, J. Crystal Growth 126 (1993) 601]. For the free-electron concentration of 5 x 10(19) cm(-3), the lattice parameters are increased by about 0.02%. Two examples will be given that even such a small lattice expansion can lead to serious modification of GaN bulk crystals what has important technological implications. In the first example, we will show that the GaN crystals (dislocation density of 100 cm(-2)) grown at high pressure of 10-15 kbar and temperature 1500-1600 degrees C possess internal strains due to an inhomogenous oxygen (donor) distribution. In the second example, we will show that the layers of GaN grown using hydride vapour phase epitaxy (HVPE) on these high-pressure GaN crystals cause significant bending of the samples. The radius of bending is as small as 10-20 cm for 30-40 mu m layers. For thicker layers, the deformation becomes plastic and the bending remains constant even after etching the substrate away. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:261 / 264
页数:4
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