Comparative study on cracking behavior of sol-gel silica antireflective coating for high-powered laser system

被引：13

作者：

Zhang, Qing-Hua ^{[1
]}

Deng, Xue-Ran ^{[1
]}

Yang, Wei ^{[1
]}

Hui, Hao-Hao ^{[1
]}

Wei, Yao-Wei ^{[1
]}

Chen, Jin-Ju ^{[2
]}

机构：

[1] China Acad Engn Phys, Chengdu Fine Opt Engn Res Ctr, Chengdu 610041, Sichuan, Peoples R China

[2] Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China

来源：

ENGINEERING FAILURE ANALYSIS | 2017年 / 82卷

基金：

中国国家自然科学基金;

关键词：

Cracking behavior; Sol-gel silica antireflective coating; KDP crystal; Residual stress; RESIDUAL-STRESS; RIDGE FORMATION; THIN-FILMS; EXFOLIATION; MECHANISMS; CRYSTALS;

D O I：

10.1016/j.engfailanal.2017.08.026

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

Potassium dihydrogen phosphate (KDP) crystal is a kind of very crucial nonlinear optics for highpowered laser equipment as frequency conversion (doubler, tripler or quadrupler) components. In this paper, investigation on cracking behavior of sol-gel silica antireflective (AR) coatings has been performed using KDP crystal as substrate. Cracking induced by heating or moisturizing posttreatment is respectively studied, in which distinct cracking behaviors have been observed. It has been interestingly found that either temperature or humidity saltation can result in coating crack generation, but the corresponding residual stress demonstrates in completely reverse ways, giving rise to distinctive crack morphology on both crack edge and bottom. The origination and the derivation of such stress manner have been stated based on the intrinsic porous structure of sol-gel silica coating, and the critical cracking condition has been suggested dependent on the relationship between the accumulated residual stress against elastic recovery capability of such coating.

引用

页码：64 / 71

页数：8

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