Effect of a Boron Underlayer on the Ordering and Orientation of Sputtered FePt Film

被引：4

作者：

Li Yong-Le ^{[1
]}

Huang An-Ping ^{[2
]}

Feng Tang-Fu ^{[1
]}

Chen Qiang ^{[1
]}

Shu Xiao-Lin ^{[1
]}

Chen Jun-Yang ^{[3
]}

Chen Zi-Yu ^{[1
,2
]}

机构：

[1] Beihang Univ, Dept Phys, Beijing 100191, Peoples R China

[2] Beihang Univ, Minist Educ, Key Lab Micronano Measurement Manipulat & Phys, Beijing 100191, Peoples R China

[3] Chinese Acad Sci, Inst Phys, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China

来源：

CHINESE PHYSICS LETTERS | 2011年 / 28卷 / 06期

基金：

高等学校博士学科点专项科研基金; 中国国家自然科学基金;

关键词：

THIN-FILMS; MAGNETIC-PROPERTIES; MICROSTRUCTURE;

D O I：

10.1088/0256-307X/28/6/067502

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

FePt multilayer films with a boron underlayer are prepared on Si (100) substrates using magnetron sputtering and vacuum annealing is carried out to obtain the hard magnetic L1(0) phase. According to the microstructural and magnetic measurement results, the ordering of the FePt films is facilitated at low annealing temperatures while it is blocked at high ones by introducing boron. Moreover, (001) orientation of the samples is obviously improved by inserting a boron underlayer, which is further confirmed by the MFM analysis. The relevant mechanism is discussed by considering the diffusion of boron atoms and the consequential in-plane tensile stress.

引用

页数：3

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