Low-energy STEM of multilayers and dopant profiles

被引:21
作者
Merli, PG [1 ]
Morandi, V [1 ]
机构
[1] CNR, Ist Microeletiron & Microsistemi, Sez Bologna, I-40129 Bologna, Italy
关键词
STEM; low-energy STEM; dopant profiles; semiconductor multilayers; SE yield; Monte Carlo simulation; mass-thickness contrast; electron device investigation;
D O I
10.1017/S1431927605050063
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A conventional scanning electron microscope equipped with a LaB6 source has been modified to operate in a scanning transmission mode. Two detection strategies have been considered, one based on the direct collection of transmitted electrons, the other on the collection of secondary electrons resulting from the conversion of the transmitted ones. Two types of specimens have been mainly investigated: semiconductor multilayers and dopant profiles in As-implanted Si. The results show that the contrast obeys the rules of mass-thickness contrast whereas the resolution is always defined by the probe size independently of specimen thickness and beam broadening. The detection strategy may affect the bright field (light regions look brighter) or dark field (heavy regions look brighter) appearance of the image. Using a direct collection of the transmitted electrons, the contrast can be deduced from the angular distribution of transmitted electrons and their collection angles. When collecting the secondary electrons to explain the image contrast, it is also necessary to take into account the secondary yield dependence on the incidence angle of the transmitted electrons.
引用
收藏
页码:97 / 104
页数:8
相关论文
共 17 条
[1]  
ARNAL F, 1969, CR ACAD SCI B PHYS, V268, P1526
[2]  
BONGELER R, 1993, SCANNING, V15, P1, DOI 10.1002/sca.4950150102
[3]   A MODEL FOR CALCULATING SECONDARY AND BACKSCATTERED ELECTRON YIELDS [J].
JOY, DC .
JOURNAL OF MICROSCOPY-OXFORD, 1987, 147 :51-64
[4]   BEAM INTERACTIONS, CONTRAST AND RESOLUTION IN THE SEM [J].
JOY, DC .
JOURNAL OF MICROSCOPY-OXFORD, 1984, 136 (NOV) :241-258
[5]   Characterization of ultrathin doping layers in semiconductors [J].
Liu, CP ;
DuninBorkowski, RE ;
Boothroyd, CB ;
Brown, PD ;
Humphreys, CJ .
MICROSCOPY AND MICROANALYSIS, 1997, 3 (04) :352-363
[6]  
LUO SC, 1988, SCANNING MICROSCOPY, V2, P1901
[7]   Backscattered electron imaging and scanning transmission electron microscopy imaging of multi-layers [J].
Merli, PG ;
Morandi, V ;
Corticelli, F .
ULTRAMICROSCOPY, 2003, 94 (02) :89-98
[8]  
Merli PG, 2002, ADV IMAG ELECT PHYS, V123, P375
[9]   Images of dopant profiles in low-energy scanning transmission electron microscopy [J].
Merli, PG ;
Corticelli, F ;
Morandi, V .
APPLIED PHYSICS LETTERS, 2002, 81 (24) :4535-4537
[10]  
Pennycook SJ, 2002, ADV IMAG ELECT PHYS, V123, P173