2 μm thin film c-Si cells on near-Lambertian Al2O3 substrates

被引:12
|
作者
Shimokawa, R
Takahashi, T
Takato, H
Ozaki, A
Takano, Y
机构
[1] Electrotech Lab, Tsukuba, Ibaraki 3058568, Japan
[2] Sci Univ Tokyo, Noda, Chiba 2780022, Japan
关键词
solar cells; thin film solar cells; thin film c-Si; alumina ceramics; optical confinement;
D O I
10.1016/S0927-0248(00)00146-X
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Near-Lambertian Al2O3 substrates, which have the reflectivity of almost 100% and superior optical diffusivity, were newly developed by the doctor-blade technique and 2 mum thin film c-Si cells with the large short-circuit current J(SC) of 15.6 mA/cm(2) (photocurrent J(ph),, of 17.5 mA/cm(2)) were fabricated on the substrates. These cells were prepared by ECR plasma chemical vapor deposition, electron-beam recrystallization, conventional phosphorus diffusion and ITO metallization. The optical confinement in such thin film c-Si cells on the diffuse-reflective substrates was experimentally and theoretically investigated. The theoretical computation presented a strong possibility of higher J(SC) beyond 30 mA/cm(2). (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:593 / 598
页数:6
相关论文
共 50 条
  • [31] Benefits of a thermal drift during atomic layer deposition of Al2O3 for c-Si passivation
    Lebreton, Fabien
    Zauner, Andy
    Bulkin, Pavel
    Silva, Francois
    Filonovich, Sergej
    Roca i Cabarrocas, Pere
    2017 IEEE 44TH PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC), 2017, : 1237 - 1240
  • [32] MOCVD growth of Si-doped α-(AlGa)2O3 on m-plane α-Al2O3 substrates
    Okumura, Hironori
    Varley, Joel B.
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2024, 63 (07)
  • [33] IMPROVED THIN-FILM AL2O3 CAPACITORS
    RAO, MK
    JAWALEKAR, SR
    THIN SOLID FILMS, 1978, 51 (02) : 185 - 188
  • [34] LEO of III-nitride on Al2O3 and Si substrates
    Razeghi, M
    Kung, P
    Sandvik, P
    Mi, K
    Zhang, X
    Dravid, VP
    Freitas, J
    Saxler, A
    PHOTODETECTORS: MATERIALS AND DEVICES V, 2000, 3948 : 320 - 329
  • [35] SiON as a barrier layer for depositing an Al2O3 thin film on Si for gate applications
    Zhen, Congmian
    He, Gang
    Wang, Xiaoliang
    Shimogaki, Yukihiro
    SURFACE AND INTERFACE ANALYSIS, 2009, 41 (12-13) : 956 - 959
  • [36] Growth of GaN on γ-Al2O3/Si(001) composite substrates
    Liu, Zhe
    Wang, Junxi
    Li, Jinmin
    Liu, Hongxin
    Wang, Qiyuan
    Wang, Jun
    Zhang, Nanhong
    Xiao, Hongling
    Wang, Xiaoliang
    Zeng, Yiping
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 2005, 26 (12): : 2378 - 2384
  • [37] Optimization of process parameters for sputtering of ceramic ZnO:Al2O3 targets for a-Si:H/μc-Si:H solar cells
    Dewald, W.
    Sittinger, V.
    Werner, W.
    Jacobs, C.
    Szyszka, B.
    THIN SOLID FILMS, 2009, 518 (04) : 1085 - 1090
  • [38] Passivation property of Al2O3 thin film for the application of n-type crystalline Si solar cells
    Jeong, Myung-Il
    Choi, Chel-Jong
    JOURNAL OF THE KOREAN CRYSTAL GROWTH AND CRYSTAL TECHNOLOGY, 2014, 24 (03): : 106 - 110
  • [39] Fabrication and characterization of Al2O3/Si composite nanodome structures for high efficiency crystalline Si thin film solar cells
    Zhang, Ruiying
    Zhu, Jian
    Zhang, Zhen
    Wang, Yanyan
    Qiu, Bocang
    Liu, Xuehua
    Zhang, Jinping
    Zhang, Yi
    Fang, Qi
    Ren, Zhong
    Bai, Yu
    AIP ADVANCES, 2015, 5 (12):
  • [40] Magnetoresistance of Fe thin films on faceted Al2O3 substrates
    Mooser, S.
    Jourdan, M.
    JOURNAL OF APPLIED PHYSICS, 2009, 105 (12)