Influence of Deposition Temperature on the Phase Evolution of HfNbTiVZr High-Entropy Thin Films

被引：42

作者：

Fritze, Stefan ^{[1
]}

Koller, Christian M. ^{[2
]}

von Fieandt, Linus ^{[1
]}

Malinovskis, Paulius ^{[1
]}

Johansson, Kristina ^{[1
]}

Lewin, Erik ^{[1
]}

Mayrhofer, Paul H. ^{[2
]}

Jansson, Ulf ^{[1
]}

机构：

[1] Uppsala Univ, Dept Chem Angstrom, SE-75120 Uppsala, Sweden

[2] TU Wien, Inst Mat Sci & Technol, A-1060 Vienna, Austria

来源：

MATERIALS | 2019年 / 12卷 / 04期

基金：

瑞典研究理事会;

关键词：

high-entropy alloys; physical vapour deposition (PVD); metallic glass; MECHANICAL-PROPERTIES; SINGLE-PHASE; ALLOY; STRENGTH; HARDNESS;

D O I：

10.3390/ma12040587

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In this study, we show that the phase formation of HfNbTiVZr high-entropy thin films is strongly influenced by the substrate temperature. Films deposited at room temperature exhibit an amorphous microstructure and are 6.5 GPa hard. With increasing substrate temperature (room temperature to 275 degrees C), a transition from an amorphous to a single-phased body-centred cubic (bcc) solid solution occurs, resulting in a hardness increase to 7.9 GPa. A higher deposition temperature (450 degrees C) leads to the formation of C14 or C15 Laves phase precipitates in the bcc matrix and a further enhancement of mechanical properties with a peak hardness value of 9.2 GPa. These results also show that thin films follow different phase formation pathways compared to HfNbTiVZr bulk alloys.

引用

页数：8

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