Low-divergence coherent soft x-ray source at 13 nm by high-order harmonics

被引:109
|
作者
Takahashi, EJ [1 ]
Nabekawa, Y [1 ]
Midorikawa, K [1 ]
机构
[1] RIKEN, Laser Technol Lab, Wako, Saitama 3510198, Japan
关键词
D O I
10.1063/1.1637949
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have generated a few tens of nanojoules of coherent soft x-ray pulses at a wavelength around 13 nm with high-order harmonics. Output energy was estimated to be 25 nJ/pulse at the 59th harmonic (13.5 nm), and the beam divergence was measured to be 0.35 mrad full width at half maximum. Since a Mo/Si mirror covers two harmonics in the high reflectivity region, we can use similar to50 nJ harmonic energy per pulse in the 13 nm wavelength. This high-coherent low-emittance x-ray source is useful for the characterization and inspection of an optical system for extreme-ultraviolet lithography. (C) 2004 American Institute of Physics.
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页码:4 / 6
页数:3
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