Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties

被引：66
作者：
Lin, Yi-Ruei [1 ]
Lai, K. Y. [1 ]
Wang, Hsin-Ping [1 ]
He, Jr-Hau [1 ,2 ]
机构：
[1] Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan
[2] Natl Taiwan Univ, Dept Elect Engn, Taipei 10617, Taiwan
来源：
NANOSCALE | 2010年 / 2卷 / 12期
关键词：
BROAD-BAND; SILICON; NANOSTRUCTURES; COATINGS; NANOWIRE; EMITTERS; TRENCHES; LIGHT; MODEL; GE;
D O I：
10.1039/c0nr00402b
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Slope-tunable Si nanorod arrays (NRAs) were fabricated with colloidal lithography and reactive ion etching (RI E). Sharpened NRAs fabricated by increasing the SF6/O-2 flow ratio during RIE exhibit enhanced antireflection (AR) and hydrophobic properties, which are attributed to the smooth gradient in the effective refractive index of NRAs, and the enlarged water/air interface of the water drops in the NRA layers, respectively. Enhanced AR characteristics via modifying the slope of NRAs are accompanied by broad-band working ranges, omnidirectionality, and polarization insensitivity. Detailed experimental and theoretical analysis of slope-tunable NRAs should benefit the development of various self-cleaning optoelectronic devices with efficient light management.
引用
收藏
页码：2765 / 2768
页数：4
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