Probing fatigue in ferroelectric thin films with subnanometer depth resolution

被引：10

作者：

Cao, Jiang-Li ^{[1
]}

Solbach, Axel

Klemradt, Uwe

Weirich, Thomas

Mayer, Joachim

Schorn, Peter J.

Boettger, Ulrich

机构：

[1] Univ Aachen, RWTH, Inst Phys 2 B, D-52056 Aachen, Germany

[2] Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China

[3] Univ Aachen, RWTH, Inst Werkstoffe Electrotech 2, D-52056 Aachen, Germany

[4] Univ Aachen, RWTH, D-52074 Aachen, Germany

来源：

APPLIED PHYSICS LETTERS | 2007年 / 91卷 / 07期

关键词：

D O I：

10.1063/1.2771534

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The authors report the study of polarization fatigue in Pb(Zr,Ti)O-3 (PZT) ferroelectric thin films using in situ high-resolution grazing incidence x-ray specular reflectivity of synchrotron radiation. The results demonstrate that there is no formation of a region of different electron densities in the film growth direction with subnanometer depth resolution during fatigue. The upper bounds on the theoretically predicted interfacial accumulation of oxygen vacancies at the interfaces between PZT and Pt electrodes are determined by the comparison of experimental results and theoretical simulations. (C) 2007 American Institute of Physics.

引用

页数：3

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