Three Dimensional Assembly in Directed Self-assembly of Block Copolymers

被引：12
|
作者：
Segal-Peretz, Tamar [1 ,2 ]
Zhou, Chun [1 ]
Ren, Jiaxing [1 ]
Dazai, Takahiro [3 ]
Ocola, Leonidas E. [4 ]
Divan, Ralu N. S. [4 ]
Nealey, Paul F. [1 ,2 ]
机构：
[1] Univ Chicago, Inst Mol Engn, 5747 South Ellis Ave, Chicago, IL 60637 USA
[2] Argonne Natl Lab, Div Mat Sci, 9700 S Cass Ave, Argonne, IL 60439 USA
[3] Tokyo Ohka Kogyo Co Ltd, 1590 Tabata, Samukawa, Kanagawa 2530114, Japan
[4] Argonne Natl Lab, Ctr Nanoscale Mat, 9700 S Cass Ave, Argonne, IL 60439 USA
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2016年 / 29卷 / 05期
关键词：
Directed self-assembly; block copolymer; lithography; contact hole; transmission electron microscopy; metrology; LITHOGRAPHY; TOMOGRAPHY; PATTERNS; FILMS;
D O I：
10.2494/photopolymer.29.653
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
The three-dimensional assembly of poly (styrene-b-methyl methacrylate) (PS-b-PMMA) in chemoepitaxy and graphoepitaxy directed self-assembly (DSA) was investigated using scanning transmission electron microscopy (STEM) tomography. The tomographic characterization revealed hidden morphologies and defects at the BCP- chemical pattern interface in lamellar DSA, and probed the formation of cylinders at the bottom of cylindrical DSA for contact hole shrink. Future work will include control over 3D assembly in sub-10 nm processes.
引用
收藏
页码：653 / 657
页数：5
相关论文
共 50 条
  • [31] Directed Self-Assembly of Block Copolymers on Sparsely Nanopatterned Substrates
    Chen, Peng
    Liang, Haojun
    Xia, Ru
    Qian, Jiasheng
    Feng, Xiaoshuang
    MACROMOLECULES, 2013, 46 (03) : 922 - 926
  • [32] Engineering the Kinetics of Directed Self-Assembly of Block Copolymers toward Fast and Defect-Free Assembly
    Ren, Jiaxing
    Zhou, Chun
    Chen, Xuanxuan
    Dolejsi, Moshe
    Craig, Gordon S. W.
    Delgadillo, Paulina A. Rincon
    Segal-Peretz, Tamar
    Nealey, Paul F.
    ACS APPLIED MATERIALS & INTERFACES, 2018, 10 (27) : 23414 - 23423
  • [33] Defect Annihilation in the Directed Self-Assembly of Block Copolymers in Films with Increasing Thickness
    Chen, Xuanxuan
    Delgadillo, Paulina R.
    Jiang, Zhang
    Craig, Gordon S. W.
    Gronheid, Roel
    Nealey, Paul F.
    MACROMOLECULES, 2019, 52 (20) : 7798 - 7805
  • [34] Controlling Interfacial Interactions for Directed Self Assembly of Block Copolymers
    Stein, Gila E.
    Mahadevapuram, Nikhila
    Mitra, Indranil
    JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS, 2015, 53 (02) : 96 - 102
  • [35] Self-Assembly of Block Copolymers on Flexible Substrates
    Park, Soojin
    Lee, Dong Hyun
    Russell, Thomas P.
    ADVANCED MATERIALS, 2010, 22 (16) : 1882 - +
  • [36] Chemical Patterns Fabricated by Nanoimprinting for Block Copolymer Directed Self-Assembly
    Wakaba, Hitomi
    Okada, Makoto
    Iyoshi, Syuso
    Haruyama, Yuichi
    Matsui, Shinji
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2014, 27 (01) : 99 - 102
  • [37] Density Multiplication by Directed Self-assembly of Block Copolymer Binary Blends
    Tada, Yasuhiko
    Akasaka, Satoshi
    Chen, Feng
    Yoshida, Hiroshi
    Takenaka, Mikihito
    Hasegawa, Hirokazu
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2009, 22 (02) : 229 - 233
  • [38] Effect of Film Thickness and Domain Spacing on Defect Densities in Directed Self-Assembly of Cylindrical Morphology Block Copolymers
    Mishra, Vindhya
    Fredrickson, Glenn H.
    Kramer, Edward J.
    ACS NANO, 2012, 6 (03) : 2629 - 2641
  • [39] Creation of guiding patterns for directed self-assembly of block copolymers by resistless direct e-beam exposure
    Evangelio, Laura
    Fernandez-Regulez, Marta
    Borrise, Xavier
    Lorenzoni, Matteo
    Fraxedas, Jordi
    Perez-Murano, Francesc
    ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VII, 2015, 9423
  • [40] A route to industry compatible directed self-assembly of high-chi PS-PDMS block copolymers
    Bohme, S.
    Girardot, C.
    Garnier, J.
    Arias-Zapata, J.
    Arnaud, S.
    Tiron, R.
    Marconot, O.
    Buttard, D.
    Zelsmann, M.
    ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES VIII, 2016, 9777
12345