Three Dimensional Assembly in Directed Self-assembly of Block Copolymers

被引:12
作者
Segal-Peretz, Tamar [1 ,2 ]
Zhou, Chun [1 ]
Ren, Jiaxing [1 ]
Dazai, Takahiro [3 ]
Ocola, Leonidas E. [4 ]
Divan, Ralu N. S. [4 ]
Nealey, Paul F. [1 ,2 ]
机构
[1] Univ Chicago, Inst Mol Engn, 5747 South Ellis Ave, Chicago, IL 60637 USA
[2] Argonne Natl Lab, Div Mat Sci, 9700 S Cass Ave, Argonne, IL 60439 USA
[3] Tokyo Ohka Kogyo Co Ltd, 1590 Tabata, Samukawa, Kanagawa 2530114, Japan
[4] Argonne Natl Lab, Ctr Nanoscale Mat, 9700 S Cass Ave, Argonne, IL 60439 USA
关键词
Directed self-assembly; block copolymer; lithography; contact hole; transmission electron microscopy; metrology; LITHOGRAPHY; TOMOGRAPHY; PATTERNS; FILMS;
D O I
10.2494/photopolymer.29.653
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The three-dimensional assembly of poly (styrene-b-methyl methacrylate) (PS-b-PMMA) in chemoepitaxy and graphoepitaxy directed self-assembly (DSA) was investigated using scanning transmission electron microscopy (STEM) tomography. The tomographic characterization revealed hidden morphologies and defects at the BCP- chemical pattern interface in lamellar DSA, and probed the formation of cylinders at the bottom of cylindrical DSA for contact hole shrink. Future work will include control over 3D assembly in sub-10 nm processes.
引用
收藏
页码:653 / 657
页数:5
相关论文
共 21 条
[21]   Three-Tone Chemical Patterns for Block Copolymer Directed Self Assembly [J].
Williamson, Lance D. ;
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Chen, Xuanxuan ;
Suh, Hyo Seon ;
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Gronheid, Roel ;
Nealey, Paul F. .
ACS APPLIED MATERIALS & INTERFACES, 2016, 8 (04) :2704-2712