Inductively coupled Cl2/Ar plasma:: Experimental investigation and modeling

被引:49
作者
Efremov, AM
Kim, DP
Kim, CI
机构
[1] Chung Ang Univ, Sch Elect & Elect Engn, Seoul 156756, South Korea
[2] Ivanovo State Univ, Dept Microelect Devices & Mat Technol, Ivanovo 153460, Russia
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2003年 / 21卷 / 04期
关键词
D O I
10.1116/1.1564030
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Electrophysical and kinetic characteristics Of Cl-2/Ar plasma were investigated to understand the influence of the addition. of Ar on the volume densities and fluxes of active particles, both neutral and charged. Our analysis combined both,experimental methods and plasma modeling. It was found that addition of Ar to Cl-2 leads to deformation of the electron energy distribution function and an increase of the electron mean energy due to the "transparency" effect. Direct electron impact dissociation Of Cl-2 molecules represents the main source of chlorine atoms in the plasma volume. The contributions of stepwise dissociation and ionization involving Ar metastable atoms were found to be negligible. Addition of Ar to Cl-2 causes the decrease of both electron and ion densities due to a decrease in the total ionization rate and the acceleration of heterogeneous decay of charged particles. (C) 2003 American Vacuum Society.
引用
收藏
页码:1568 / 1573
页数:6
相关论文
共 25 条
  • [1] Spatially averaged (global) model of time modulated high density chlorine plasmas
    Ashida, S
    Lieberman, MA
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (02): : 854 - 861
  • [2] Gas discharge plasmas and their applications
    Bogaerts, A
    Neyts, E
    Gijbels, R
    van der Mullen, J
    [J]. SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 2002, 57 (04) : 609 - 658
  • [3] Damage in etching of (Ba,Sr)TiO3 thin films using inductively coupled plasma
    Choi, SK
    Kim, DP
    Kim, CI
    Chang, EG
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (04): : 1063 - 1067
  • [4] REMOTE PLASMA-ETCHING REACTORS - MODELING AND EXPERIMENT
    DESHMUKH, SC
    ECONOMOU, DJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (02): : 206 - 215
  • [5] Efremov AM, 1998, HIGH ENERG CHEM+, V32, P193
  • [6] EFREMOV AM, 1993, HIGH ENERG CHEM+, V27, P83
  • [7] EFREMOV AM, 2001, SEMICOND SCI TECH, V1, P197
  • [8] Electron temperatures of inductively coupled Cl2-Ar plasmas
    Fuller, NCM
    Donnelly, VM
    Herman, IP
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (01): : 170 - 173
  • [9] Optical actinometry of Cl2, cl, Cl+, and Ar+ densities in inductively coupled Cl2-Ar plasmas
    Fuller, NCM
    Herman, IP
    Donnelly, VM
    [J]. JOURNAL OF APPLIED PHYSICS, 2001, 90 (07) : 3182 - 3191
  • [10] HAHNYB, 1999, J VAC SCI TECHNOL B, V17, P334