Processing of acrylate based 193 nm resists: Influence of physico-chemical properties

被引：3

作者：

Mortini, B ^{[1
]}

Rosilio, C ^{[1
]}

Prola, A ^{[1
]}

Paniez, PJ ^{[1
]}

机构：

[1] SGS Thomson Microelect, F-38926 Crolles, France

来源：

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XV, PTS 1 AND 2 | 1998年 / 3333卷

关键词：

193 nm lithography; acrylate polymers; physical properties; chemical properties; THP group;

D O I：

10.1117/12.312406

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The large variety of protecting groups that can be employed for acrylate based resists increases the number of mechanisms encountered when implementing these new materials. Some of these phenomena, related to both their physical and chemical properties, are investigated.

引用

页码：176 / 187

页数：2