Analysis of nonradiative recombination mechanisms and their impacts on the device performance of InGaN/GaN light-emitting diodes

被引:33
作者
Han, Dong-Pyo [1 ]
Oh, Chan-Hyoung [1 ]
Zheng, Dong-Guang [1 ]
Kim, Hyunsung [1 ]
Shim, Jong-In [1 ]
Kim, Kyu-Sang [2 ]
Shin, Dong-Soo [3 ,4 ]
机构
[1] Hanyang Univ, Dept Elect & Commun Engn, Ansan 426791, Gyeonggi, South Korea
[2] Sangji Univ, Dept Appl Phys & Elect, Wonju 220702, Gangwon, South Korea
[3] Hanyang Univ, Dept Appl Phys, Ansan 426791, Gyeonggi, South Korea
[4] Hanyang Univ, Dept Bionanotechnol, Ansan 426791, Gyeonggi, South Korea
基金
新加坡国家研究基金会;
关键词
EFFICIENCY DROOP;
D O I
10.7567/JJAP.54.02BA01
中图分类号
O59 [应用物理学];
学科分类号
摘要
We investigate the nonradiative recombination mechanisms of two conventional InGaN/GaN-based blue light-emitting diodes with different threading dislocation densities (TDDs). The current-voltage, the ideality factor, and the slope of the light-versus-current curve on log scales are analyzed to distinguish the dominant nonradiative recombination mechanisms at room temperature. Through the analysis, we infer the dominant nonradiative recombination mechanisms to be the Shockley-Read-Hall process for the sample with a low TDD (similar to 1 x 10(8)cm(-2)) and the defect-assisted tunneling for the sample with a high TDD (similar to 1 x 10(9)cm(-2)). For more detailed analysis of the nonradiative recombination mechanisms and their impacts on the device performance, we execute the temperature-dependent photovoltage and temperature-dependent electroluminescence efficiency experiments. The sample with a low TDD is found to be more prone to the carrier spill-over at cryogenic temperatures due to the deactivation of point defects, while the sample with a high TDD is more robust to the operation at cryogenic temperatures owing to the relative insensitiveness of the defect-assisted tunneling to temperature. (C) 2015 The Japan Society of Applied Physics
引用
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页数:4
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