Metal film precision resistors: Resistive metal films and a new resistor concept

被引:39
作者
van den Broek, JJ
Donkers, JJTM
van der Rijt, RAF
Janssen, JTM
机构
[1] Philips Res Labs, NL-5656 AA Eindhoven, Netherlands
[2] Philips Components BV, NL-6042 GG Roermond, Netherlands
关键词
resistor; sheet resistance; temperature coefficient of the resistance (TCR); metal films; sputtering; trimming; SiCrN; SiCrO; NiCrAl; CuNi;
D O I
10.1016/S0165-5817(98)00013-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Metal-films for precision resistors combine a very low temperature dependence of the electrical resistance with a tolerance of the resistance of only 0.1%. Corrosion resistance and adhesion to the substrate are of major importance. There are different classes of materials being utilised. For low ohmic applications, we use Cu-Ni alloys with a composition of about 65 at.% (atomic percent) of Cu. For this special alloy, the low temperature coefficient of the resistance (TCR) is a stable, intrinsic property, For most alloys, however, annealing is essential to approach the stale of zero TCR. This is the case for the NiCrAl alloys, used for the mid-range of resistances and for SiCrN for high ohmic applications. In high ohmic films, metals are often combined with non-metallic substances like oxides or nitrides. Variation of alloy composition, sputtering conditions and annealing procedures are important for obtaining optimum thin-film properties. Important tools for thin-film characterisation are electron microscopy and related techniques together with high-temperature resistance measurement.
引用
收藏
页码:429 / 447
页数:19
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