Significantly reduced leakage currents in organic thin film transistors with Mn-doped Bi2Ti2O7 high-k gate dielectrics

被引:6
作者
Cho, Kwang-Hwan [2 ]
Kang, Min-Gyu [1 ]
Jang, Ho Won [1 ]
Shin, Hyun Yong [3 ]
Kang, Chong-Yun [1 ]
Yoon, Seok-Jin [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Elect Mat Res Ctr, Seoul 130650, South Korea
[2] Univ Wisconsin, Dept Mat Sci, Madison, WI 53706 USA
[3] Namseoul Univ, Dept Elect Engn, Cheonan 331707, South Korea
来源
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS | 2012年 / 6卷 / 05期
关键词
OTFT; high-k gate dielectrics; BiTiO; leakage currents; PULSED-LASER DEPOSITION; CHEMICAL SOLUTION DECOMPOSITION; ELECTRICAL-PROPERTIES; STRONTIUM-TITANATE; INSULATORS;
D O I
10.1002/pssr.201206080
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report the fabrication of organic thin-film transistors (OTFTs) with high-k gate dielectrics of Mn-doped Bi2Ti2O7 (BTO) films. 3% Mn-doped BTO films deposited on polymer substrates by pulsed laser deposition at room temperature exhibit low leakage currents of 2.1 x 10(8) A/cm2 at an applied electric field of 0.3 MV/cm, while undoped BTO films show much higher leakage currents of 4.3 x 10(4) A/cm2. Mn doping effectively reduces the number of oxygen vacancies in the films and improves the electrical properties. Low operation voltage and significantly reduced leakage currents are demonstrated in pentacene-based OTFTs with the Mn-doped BTO gate dielectrics. (C) 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
引用
收藏
页码:208 / 210
页数:3
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