Reverse leakage current calculations for SiC Schottky contacts

被引:58
作者
Crofton, J [1 ]
Sriram, S [1 ]
机构
[1] NORTHROP GRUMMAN SCI & TECHNOL CTR,PITTSBURGH,PA 15235
关键词
D O I
10.1109/16.544427
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Reverse leakage current calculations as a function of Schottky barrier height and temperature have been performed for metal gates on n-type 6H-SiC. These calculations were performed using a WKB evaluation of the tunneling probability through a reverse biased Schottky barrier and numerically integrating over all energies to find the reverse current density. This method is shown to yield much better agreement with previously published reverse leakage currents on 6H-SiC than can be obtained using thermionic emission theory.
引用
收藏
页码:2305 / 2307
页数:3
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