High throughput characterization of the optical properties of compositionally graded combinatorial films

被引：13

作者：

Schenck, PK ^{[1
]}

Kaiser, DL ^{[1
]}

Davydov, AV ^{[1
]}

机构：

[1] NIST, Mat Sci & Engn Lab, Gaithersburg, MD 20899 USA

来源：

APPLIED SURFACE SCIENCE | 2004年 / 223卷 / 1-3期

关键词：

reflectometry; thin films; optical properties; combinatorial;

D O I：

10.1016/j.apsusc.2003.07.005

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Compositionally graded combinatorial films have been characterized by a high throughput automated spectroscopic reflectometer. The data from this instrument were used to map the thickness and index of refraction of the compositionally varying films. Combinatorial films produced by dual-beam, dual-target pulsed laser deposition and characterized with the reflectometer include the BaTiO3-SrTiO3 system on silicon (dielectric and ferroelectric films). In addition, combinatorial Au/Ni electrical contacts on n-GaN/sapphire produced by electron-beam (e-beam) vaporization have been characterized with the spectroscopic reflectometer. The Au/Ni/n-GaN/sapphire structures were characterized both as-deposited and after annealing at 400 degreesC for 60 s in flowing argon. (C) 2003 Published by Elsevier B.V.

引用

页码：200 / 205

页数：6

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