Excimer laser use for microetching computer-generated holographic structures

被引：47

作者：

Vainos, NA ^{[1
]}

Mailis, S ^{[1
]}

Pissadakis, S ^{[1
]}

Boutsikaris, L ^{[1
]}

Parmiter, PJM ^{[1
]}

Dainty, P ^{[1
]}

Hall, TJ ^{[1
]}

机构：

[1] UNIV LONDON KINGS COLL,DEPT ELECT & ELECT ENGN,LONDON WC2R 2LS,ENGLAND

来源：

APPLIED OPTICS | 1996年 / 35卷 / 32期

关键词：

computer-generated holograms; optical interconnects; micro-optics; excimer laser; materials; processing;

D O I：

10.1364/AO.35.006304

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Excimer-laser microetching of a variety of materials is applied to the fabrication of surface-relief optical microstructures of arbitrary morphology, with particular emphasis on computer-generated holographic structures. High-definition, high-radiation-intensity selective laser ablative etching in conjunction with step-and-repeat (period) replication or raster (pixel) scanning is used. To support such developments, the characteristic etching properties of a wide range of solid materials, from metals to semiconductors and polymers, are studied. Optical-interconnect and generic object holograms are produced by means of this alternative one-step holographic information-recording method. (C) 1996 Optical Society of America

引用

页码：6304 / 6319

页数：16