Excimer laser use for microetching computer-generated holographic structures

被引:47
|
作者
Vainos, NA [1 ]
Mailis, S [1 ]
Pissadakis, S [1 ]
Boutsikaris, L [1 ]
Parmiter, PJM [1 ]
Dainty, P [1 ]
Hall, TJ [1 ]
机构
[1] UNIV LONDON KINGS COLL,DEPT ELECT & ELECT ENGN,LONDON WC2R 2LS,ENGLAND
来源
APPLIED OPTICS | 1996年 / 35卷 / 32期
关键词
computer-generated holograms; optical interconnects; micro-optics; excimer laser; materials; processing;
D O I
10.1364/AO.35.006304
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Excimer-laser microetching of a variety of materials is applied to the fabrication of surface-relief optical microstructures of arbitrary morphology, with particular emphasis on computer-generated holographic structures. High-definition, high-radiation-intensity selective laser ablative etching in conjunction with step-and-repeat (period) replication or raster (pixel) scanning is used. To support such developments, the characteristic etching properties of a wide range of solid materials, from metals to semiconductors and polymers, are studied. Optical-interconnect and generic object holograms are produced by means of this alternative one-step holographic information-recording method. (C) 1996 Optical Society of America
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页码:6304 / 6319
页数:16
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