共 19 条
Tuning Temperature and Size of Hot Spots and Hot-Spot Arrays
被引:29
作者:

Saidi, Elika
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CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France

Babinet, Nicolas
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CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France

Lalouat, Loic
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机构:
CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France

Lesueur, Jerome
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CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France

Aigouy, Lionel
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CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France

Volz, Sebastian
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h-index: 0
机构:
Ecole Cent Paris, Lab Energet Mol & Macroscop Combust, CNRS, UFR 288, F-92295 Chatenay Malabry, France CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France

Labeguerie-Egea, Jessica
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h-index: 0
机构:
ENSCP, Lab Chim Mat Condensee Paris, CNRS, UMR 7574, F-75005 Paris, France CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France

Mortier, Michel
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h-index: 0
机构:
ENSCP, Lab Chim Mat Condensee Paris, CNRS, UMR 7574, F-75005 Paris, France CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France
机构:
[1] CNRS ESPCI UPMC, Lab Phys & Etud Mat, UMR 8213, F-75231 Paris 5, France
[2] Ecole Cent Paris, Lab Energet Mol & Macroscop Combust, CNRS, UFR 288, F-92295 Chatenay Malabry, France
[3] ENSCP, Lab Chim Mat Condensee Paris, CNRS, UMR 7574, F-75005 Paris, France
来源:
关键词:
SCANNING THERMAL MICROSCOPY;
D O I:
10.1002/smll.201001476
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
By using scanning thermal microscopy, it is shown that nanoscale constrictions in metallic micro wires deposited on an oxidized silicon substrate can be tuned in terms of temperature and confinement size. High-resolution temperature maps indeed show that submicrometer hot spots and hot-spot arrays are obtained when the SiO2 layer thickness decreases below 100 nm. When the SiO2 thickness becomes larger, heat is less confined in the vicinity of the constrictions and laterally spreads all along the micro wire. These results are in good agreement with numerical simulations, which provide dependences between silica-layer thickness and nanodot shape and temperature.
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页码:259 / 264
页数:6
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