Ultrasonic attenuation in glasses of SiO2-GeO2 mixture

被引：10
作者：
Kosugi, T
Kobayashi, H
Kogure, Y
机构：
[1] NATL RES LAB METROL, TSUKUBA, IBARAKI 305, JAPAN
[2] NISHI TOKYO UNIV, YAMANASHI 40901, JAPAN
来源：
PHYSICA B-CONDENSED MATTER | 1996年 / 219-20卷
关键词：
D O I：
10.1016/0921-4526(95)00713-X
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
Ultrasonic absorption on Si0(2)-5 mole% GeO2 and SiO2-10 mole% GeO2 glasses between 1.6-250 K shows that the most probable origin of the structural relaxation of SiO2 glass is the transverse motion of the oxygen atom in Si-O-Si bridge among existing models. In addition it is also suggested that the same structure is the origin of two-level system (TLS) phenomena below 10 K.
引用
收藏
页码：261 / 263
页数：3
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