Three-dimensional micropatterning of graphene by femtosecond laser direct writing technology

被引：38
|
作者：
Liu, Yu-Qing [1 ]
Mao, Jiang-Wei [1 ]
Chen, Zhao-Di [1 ]
Han, Dong-Dong [1 ]
Jiao, Zhi-Zhen [1 ]
Ma, Jia-Nan [1 ]
Jiang, Hao-Bo [2 ]
Yang, Han [1 ]
机构：
[1] Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, 2699 Qianjin St, Changchun 130012, Peoples R China
[2] Jilin Univ, Minist Educ, Key Lab Bion Engn, Changchun 130022, Peoples R China
来源：
OPTICS LETTERS | 2020年 / 45卷 / 01期
基金：
中国国家自然科学基金;
关键词：
SUPERHYDROPHOBIC GRAPHENE; FABRICATION; OXIDE; FILMS; REDUCTION; MEMBRANES;
D O I：
10.1364/OL.45.000113
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The reduction and patterning of graphene oxides (GOs) have broad applications in gene transfection, cell differentiation control, etc. However, two-dimensional (2D) photoreduction technologies (such as UV lithography) fail to realize the three-dimensional (3D) reduction and. patterning of GO, limiting its applications in 3D electronic device interconnection and 3D graphene organ-on-a-chip. Here we developed 3D reduction and patterning of GO by femtosecond laser direct writing (FsLDW) technology. FsLDW has been adopted for 3D structure fabrication and 2D/3D micropatterning of reduced GOs on GO films. We deem that this technology will advance GO in the evolution of future electronics. (C) 2019 Optical Society of America
引用
收藏
页码：113 / 116
页数：4
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