Effect of deposition ambient on structural and optical properties of MgxZn1-xO alloy thin films grown by RF sputtering

被引：3
作者：
Li, Jia [1 ,2 ]
Huang, Jin-Hua [1 ]
Song, Wei-Jie [1 ]
Tan, Rui-Qin [3 ]
Yang, Ye [1 ]
Li, Xiao-Min [2 ]
机构：
[1] Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China
[2] Chinese Acad Sci, Shanghai Inst Ceram, Shanghai 200050, Peoples R China
[3] Ningbo Univ, Coll Informat Sci & Engn, Ningbo 315211, Zhejiang, Peoples R China
来源：
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS | 2010年 / 21卷 / 12期
基金：
浙江省自然科学基金;
关键词：
TEMPERATURE;
D O I：
10.1007/s10854-010-0070-6
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
MgxZn1-xO thin films were deposited on Corning eagle 2,000 glass substrates by a RF magnetron sputtering using a ceramic target. The effect of Ar/O-2 ratios on structural and optical properties was investigated. The XRD results showed that the film demonstrated the best structural properties when the Ar/O-2 ratio equal 7:3. Sputtering ambient seemed to have minor effect on the optical properties of MgxZn1-xO thin films.
引用
收藏
页码：1327 / 1331
页数：5
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