AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering for SAW applications

被引：44
|
作者：
Aissa, K. Ait [1 ,2 ]
Achour, A. [3 ]
Elmazria, O. [2 ]
Simon, Q. [1 ]
Elhosni, M. [2 ]
Boulet, P. [2 ]
Robert, S. [2 ]
Djouadi, M. A. [1 ]
机构：
[1] Univ Nantes, Inst Mat Jean Rouxel, CNRS, UMR 6502, F-44322 Nantes 3, France
[2] Univ Lorraine, IJL, CNRS, UMR 7198, F-54506 Vandoeuvre Les Nancy, France
[3] CNRS, LAAS, F-31400 Toulouse, France
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 2015年 / 48卷 / 14期
关键词：
aluminum nitride; physical vapor deposition; HiPIMS; surface acoustic wave; LOW-TEMPERATURE; RESIDUAL-STRESS; DEVICES; GROWTH;
D O I：
10.1088/0022-3727/48/14/145307
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
In this work, aluminium nitride (AlN) films were deposited on silicon substrates buffered by an epitaxial AlN thin film for surface acoustic wave (SAW) applications. The films were deposited by dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) deposition techniques. The structural properties of AlN films were investigated using x-ray diffraction (XRD), Raman spectroscopy, scanning electron microscopy and atomic force microscopy. In both cases of films deposited by dcMS and HiPIMS, the XRD results showed that the obtained films are oriented, with full width at half maximum rocking curves of around 1 degrees. Raman spectroscopy revealed higher residual stress relaxation in the AlN epilayers grown by HiPIMS compared to AlN grown by dcMS, highlighted by a blue shift in the E2(high) Raman mode. The SAW measurements indicated an insertion loss of AlN-SAW devices of about 53 and 35 dB for the AlN films deposited by dcMS and HiPIMS respectively. The relation between the structural properties of AlN and the characteristics of AlN-SAW devices were correlated and discussed.
引用
收藏
页数：6
相关论文
共 50 条
  • [1] Textured hexagonal and cubic phases of AlN films deposited on Si (100) by DC magnetron sputtering and high power impulse magnetron sputtering
    Riah, B.
    Ayad, A.
    Camus, J.
    Rammal, M.
    Boukari, F.
    Chekour, L.
    Djouadi, M. A.
    Rouag, N.
    THIN SOLID FILMS, 2018, 655 : 34 - 40
  • [2] Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures
    Aissa, K. Ait
    Achour, A.
    Camus, J.
    Le Brizoual, L.
    Jouan, P-Y.
    Djouadi, M-A.
    THIN SOLID FILMS, 2014, 550 : 264 - 267
  • [3] CuO films deposited by superimposed high power impulse and DC magnetron sputtering
    Semenov, V. A.
    Grenadyorov, A. S.
    Oskirko, V. O.
    Zakharov, A. N.
    Rabotkin, S. V.
    Ionov, I. V.
    Solovyev, A. A.
    14TH INTERNATIONAL CONFERENCE GAS DISCHARGE PLASMAS AND THEIR APPLICATIONS, 2019, 1393
  • [4] Multicomponent TixNbCrAl nitride films deposited by dc and high-power impulse magnetron sputtering
    Shu, Rui
    Du, Hao
    Sadowski, Grzegorz
    Dorri, Megan M.
    Rosen, Johanna
    Sortica, Mauricio A.
    Primetzhofer, Daniel
    Lundin, Daniel
    le Febvrier, Arnaud
    Eklund, Per
    SURFACE & COATINGS TECHNOLOGY, 2021, 426
  • [5] Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit
    Paulitsch, J.
    Schenkel, M.
    Zufrass, Th.
    Mayrhofer, P. H.
    Muenz, W.-D.
    THIN SOLID FILMS, 2010, 518 (19) : 5558 - 5564
  • [6] Achieving high thermal conductivity from AlN films deposited by high-power impulse magnetron sputtering
    Aissa, K. Ait
    Semmar, N.
    Achour, A.
    Simon, Q.
    Petit, A.
    Camus, J.
    Boulmer-Leborgne, C.
    Djouadi, M. A.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2014, 47 (35)
  • [7] Microstructure of ZnO thin films deposited by high power impulse magnetron sputtering
    Reed, A. N.
    Shamberger, P. J.
    Hu, J. J.
    Muratore, C.
    Bultman, J. E.
    Voevodin, A. A.
    THIN SOLID FILMS, 2015, 579 : 30 - 37
  • [8] High power impulse magnetron sputtering and its applications
    Yuan, Yan
    Yang, Lizhen
    Liu, Zhongwei
    Chen, Qiang
    PLASMA SCIENCE & TECHNOLOGY, 2018, 20 (06)
  • [9] Comparison of microstructures and magnetic properties in FePt alloy films deposited by direct current magnetron sputtering and high power impulse magnetron sputtering
    Yang, Wen-Sheng
    Sun, Ta-Huang
    Chen, Sheng-Chi
    Jen, Shien-Uang
    Guo, Han-Jie
    Liao, Ming-Han
    Chen, Jiann-Ruey
    JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 803 : 341 - 347
  • [10] Structure of AlN films deposited by magnetron sputtering method
    Nowakowska-Langier, K.
    Chodun, R.
    Zdunek, K.
    Minikayev, R.
    Nietubyc, R.
    MATERIALS SCIENCE-POLAND, 2015, 33 (03): : 639 - 643
12345