Ion energy and angular distributions in low-pressure capacitive oxygen RF discharges driven by tailored voltage waveforms

被引：46

作者：

Donko, Zoltan ^{[1
,2
]}

Derzsi, Aranka ^{[1
,3
]}

Vass, Mate ^{[1
]}

Schulze, Julian ^{[3
,4
]}

Schuengel, Edmund ^{[5
]}

Hamaguchi, Satoshi ^{[2
]}

机构：

[1] Hungarian Acad Sci, Wigner Res Ctr Phys, Inst Solid State Phys & Opt, Konkoly Thege Miklos Str 29-33, H-1121 Budapest, Hungary

[2] Osaka Univ, Grad Sch Engn, Ctr Atom & Mol Technol, 2-1 Yamadaoka, Suita, Osaka 5650871, Japan

[3] West Virginia Univ, Dept Phys, Morgantown, WV USA

[4] Ruhr Univ Bochum, Inst Elect Engn, Bochum, Germany

[5] Evatec AG, CH-9477 Truebbach, Switzerland

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 2018年 / 27卷 / 10期

基金：

美国国家科学基金会;

关键词：

capacitive plasma; radio-frequency oxygen discharge; ion flux-energy/angular distributions; PLASMA; SIMULATION; ADHESION; SILICON; SINGLE; MODEL; FILMS;

D O I：

10.1088/1361-6595/aae5c3

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

We investigate the energy and angular distributions of ions reaching the electrodes in low-pressure, capacitively coupled oxygen radio-frequency discharges. These distributions, as well as the possibility of the independent control of the ion flux and the ion energy are analysed for different types of excitation: single- and classical dual-frequency, as well as valley- and sawtooth-type waveforms. The studies are based on kinetic, particle-based simulations that reveal the physics of these discharges in great detail. The conditions cover weakly collisional to highly collisional domains of ion transport via the electrode sheaths. Analytical models are also applied to understand the features of the energy and angular distribution functions.

引用

页数：20

共 87 条

[1] Grid-pattern formation of extracellular matrix on silicon by low-temperature atmospheric-pressure plasma jets for neural network biochip fabrication [J].