Optimizing parameter for electrophoretic deposition of hydroxyapatite coating with superior corrosion resistance on pure titanium

Bioactive hydroxyapatite (HA) coating is applied on a commercially pure Ti by electrophoretic deposition (EPD). Optimizing the coating structure is necessary to obtain a stable layer and the best corrosion protection. The EPD was conducted at a constant voltage of 20, 30, and 40 V for 30 min in a HA/DMF (dimethylformamide) suspension. Uniform HA layers with a Ca/P ratio of 1.82 were successfully deposited on the Ti surface. The layers, which consisted of HA grains with the size of 1-5 mu m, exhibited a gradual increase in thickness of 32, 50, and 60 mu m with formation voltage. For the biomedical application, the suitable coating thickness was at least 50 mu m. The high compaction of HA grains deposited at 30 V led to an order magnitude higher polarization resistance and ten times lower corrosion current density relative to the other specimens. The porous HA layer formed at 20 V, and the presence of cracks in the 40 V-coating led to a lower corrosion resistance relative to the 30-V coating. The 20 V- and 30 V-coatings remained intact and triggered the deposition of HA during immersion in simulated body fluid for 28 days, while the 40 V-coating dissolved into the solution. The optimum EPD voltage for depositing a stable HA coating with reasonable coating thickness and the best corrosion resistance was 30 V.